# US 8,784,974 B2 · Sub-10 NM line features via rapid graphoepitaxial self-assembly of amphiphilic monolayers > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 8,784,974 B2 - Document ID: US8784974B2 - Status: Granted - Kind: B2 - Application number: 13/473,748 - Filed: 2012-05-17 - Published: 2012-09-06 - Granted: 2014-07-22 - Earliest claimed: 2007-03-22 - Assignees: Micron Technology, Inc. - Applicants: Dan B. Millward - Inventors: Dan B. Millward - Web page: https://patentgrep.com/patent/US8784974B2 ## CPC - H10P 90/00: Preparation of wafers not covered by a single main group of this subclass, e.g. wafer reinforcement - B05D 3/007: {After-treatment} - B81C 1/00031: {Regular or irregular arrays of nanoscale structures, e.g. etch mask layer (photomechanical, e.g. photolithographic, production of textured or patterned surfaces G03F7/00; lithographic processes for making patterned surfaces using printing and stamping G03F7/0002)} - B82Y 30/00: Nanotechnology for materials or surface science, e.g. nanocomposites - H10P 50/695: {characterised by the process involved to create the mask, e.g. lift-off masks or sidewalls or to modify the mask} - H10P 50/73: {using masks for insulating materials} - B81C 2201/0149: Forming nanoscale microstructures using auto-arranging or self-assembling material - B81C 2201/0198: for making a masking layer - Y10T 428/24: Structurally defined web or sheet [e.g., overall dimension, etc.] - Y10T 428/24149: Honeycomb-like - Y10T 428/24174: including sheet or component perpendicular to plane of web or sheet - Y10T 428/24521: with component conforming to contour of nonplanar surface - Y10T 428/2457: Parallel ribs and/or grooves - Y10T 428/24612: Composite web or sheet - Y10T 428/24802: Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.] - H10P: GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10 - B05D: PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL (conveying articles or workpieces through baths of liquid B65G, e.g. B65G49/02) - B81C: PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS (making microcapsules or microballoons B01J13/02; processes or apparatus specially adapted for the manufacture or treatment of piezoelectric, electrostrictive or magnetostrictive elements per se H10N30/01) - B82Y: SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES - Y10T: TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION ## Abstract Methods for fabricating sub-lithographic, nanoscale microchannels utilizing an aqueous emulsion of an amphiphilic agent and a water-soluble, hydrogel-forming polymer, and films and devices formed from these methods are provided. ## Claims ### Claim 1 A method for forming a structure for a template for etching a substrate, comprising: depositing an aqueous emulsion comprising an amphiphilic material and a water-soluble, hydrogel-forming polymer material within a trench in a material overlying the substrate, the trench having sidewalls and a floor, wherein the amphiphilic material self-assembles selectively on the sidewalls of the trench and the polymer material self-assembles selectively on the floor of the trench; and cross-linking the polymer material to form a cross-linked, water-soluble polymer hydrogel material on the floor of the trench. ### Claim 2 (depends on 1) The method of claim 1, further comprising drying the cross-linked, water-soluble polymer hydrogel material. ### Claim 3 (depends on 1) The method of claim 1, further comprising removing a portion of the cross-linked, water-soluble polymer hydrogel material to expose the self-assembled amphiphilic material on the sidewalls of the trench. ### Claim 4 (depends on 1) The method of claim 1, further comprising removing the self-assembled amphiphilic material to form a gap between the cross-linked, water-soluble polymer hydrogel material and the sidewalls of the trench and expose the substrate at the floor of the trench. ### Claim 5 (depends on 4) The method of claim 4, wherein the gap between the cross-linked, water-soluble polymer hydrogel material and the sidewalls of the trench is less than or equal to about 10 nm. ### Claim 6 (depends on 1) The method of claim 1, further comprising, before depositing the aqueous emulsion, forming a hydrophobic material on the sidewalls of the trench and a hydrophilic material on the floor of the trench. ### Claim 7 (depends on 1) The method of claim 1, wherein cross-linking the polymer material comprises applying a catalyst onto the aqueous emulsion within the trench. ### Claim 8 (depends on 1) The method of claim 1, further comprising applying a silicon ester material to the cross-linked, water-soluble polymer hydrogel material to effect a sol-gel reaction. ### Claim 9 (depends on 1) The method of claim 1, further comprising, prior to depositing the aqueous emulsion: forming a self-assembled lamellar-phase block copolymer within another trench having other sidewalls and another floor defined by another material overlying the material overlying the substrate; selectively removing one block of the self-assembled block copolymer material to form openings to expose the material overlying the substrate at the another floor of the another trench; and etching through the openings to form second trenches in the substrate, the second trenches having hydrophobic sidewalls and a hydrophilic floor, the second trenches including the trench in the material overlying the substrate; wherein depositing the aqueous emulsion comprises depositing the aqueous emulsion into the trench of the second trenches. ### Claim 10 A method for forming a structure for a template for etching a substrate, comprising: depositing an aqueous emulsion comprising an amphiphilic surfactant and a water-soluble, hydrogel-forming polymer material into a trench in a material overlying the substrate, the trench having hydrophobic sidewalls and a hydrophilic floor such that the polymer material self-assembles selectively on the floor of the trench and the amphiphilic surfactant self-assembles selectively on the sidewalls of the trench; and cross-linking the polymer material to form a cross-linked, water-soluble polymer hydrogel material situated on the floor of the trench. ### Claim 11 A method for fabricating an etch mask on a substrate, comprising: depositing an aqueous emulsion comprising an amphiphilic surfactant material and a water-soluble, hydrogel-forming polymer material into a trench in a material overlying the substrate, the trench having sidewalls and a floor such that the polymer material self-assembles on the floor of the trench and the amphiphilic surfactant material self-assembles selectively on the sidewalls; cross-linking the polymer material to form a cross-linked, water-soluble polymer hydrogel material situated on the floor of the trench; and removing the amphiphilic surfactant material to form an opening between the cross-linked, water-soluble polymer hydrogel material and the sidewalls of the trench to expose the substrate at the floor of the trench. ### Claim 12 (depends on 11) The method of claim 11, further comprising etching the substrate through the opening. ### Claim 13 A structure for a template for etching a substrate, comprising: a fill within a trench in a material overlying the substrate, the trench having sidewalls and a floor, the fill comprising a cross-linked, water-soluble polymer hydrogel material situated on the floor of the trench with an amphiphilic material on the sidewalls of the trench. ### Claim 14 A structure for a template for etching a substrate, comprising: a first trench in a material overlying a substrate, the first trench having a length; and a plurality of lines within the first trench, the plurality of lines comprising a polymer material, lines of the plurality separated from one another by openings extending for the length of the first trench, the openings exposing second trenches in the substrate, the second trenches containing a cross-linked, water-soluble polymer hydrogel material between an amphiphilic material situated on sidewalls of the second trenches. ### Claim 15 An intermediate structure for a template for etching a substrate, comprising: a cross-linked hydrogel formed from a water-soluble polymer, the cross-linked hydrogel wetting a floor of a trench; and a planar structure of an amphiphilic agent disposed on sidewall surfaces of the trench, the planar structure having a thickness of less than or equal to about 10 nm. ### Claim 16 (depends on 15) The intermediate structure of claim 15, wherein the planar structure of the amphiphilic agent is disposed on end sidewall surfaces of the trench. ### Claim 17 (depends on 15) The intermediate structure of claim 15, wherein the water-soluble polymer is selected from the group consisting of poly(ethylene oxide), poly(ethylene glycol), poly(vinyl alcohol), and poly(saccharide). ### Claim 18 (depends on 15) The intermediate structure of claim 15, wherein the amphiphilic agent is selected from the group consisting of a phospholipid, nonionic surfactant, acryloylated sulfosuccinic acid ester surfactant, and hydroxybenzoic acid. ### Claim 19 (depends on 15) The intermediate structure of claim 15, wherein the cross-linked hydrogel comprises a hardening agent selected from the group consisting of silicon dioxide, a metal oxide, carbonate, carbon black, and solvated metal. ### Claim 20 (depends on 15) The intermediate structure of claim 15, further comprising a silicon ester overlying the fill. ### Claim 21 An intermediate structure for a template for etching a substrate, comprising: a first trench in a material overlying a substrate; a polymer material within the first trench, the polymer material defining openings distributed across a width of the first trench, each of the openings having an opening width of about 10-60 nm, each of the openings extending a length of the first trench, the openings exposing second trenches in the substrate; and a cross-linked hydrogel within at least one of the second trenches, the cross-linked hydrogel formed from a water-soluble polymer and comprising an amphiphilic agent on sidewalls of the second trenches.