# US 8,784,930 B2 · Transparent conductive film having high optical transmittance and method for manufacturing the same

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- Number: US 8,784,930 B2
- Document ID: US8784930B2
- Status: Granted
- Kind: B2
- Application number: 13/243,328
- Filed: 2011-09-23
- Published: 2012-04-05
- Granted: 2014-07-22
- Earliest claimed: 2010-09-30
- Assignees: Far Eastern New Century Corporation
- Applicants: Da-Ren Chiou; Wei-Che Hung; Shih-Yueh Lin; Chiu-Fang Chen; Tzu-Ying Chen
- Inventors: Da-Ren Chiou; Wei-Che Hung; Shih-Yueh Lin; Chiu-Fang Chen; Tzu-Ying Chen
- Web page: https://patentgrep.com/patent/US8784930B2

## CPC

- G03F 7/0048: {characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents}
- B82Y 30/00: Nanotechnology for materials or surface science, e.g. nanocomposites
- G03F 7/027: Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds (G03F7/075 takes precedence)
- G03F 7/2014: {Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame}
- G03F 7/26: Processing photosensitive materials; Apparatus therefor (G03F7/12 - G03F7/24 take precedence)
- G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G)
- B82Y: SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES

## Abstract

The present invention pertains to a transparent conductive film including a conductive layer having different thicknesses so as to increase the optical transmittance while maintaining the conductivity of the transparent conductive film. The present invention also pertains to a process for the preparation of the above-mentioned transparent conductive film.

## Claims

### Claim 1

A method for preparing a transparent conductive film, comprising:
(a) providing a substrate;
(b)-coating a photosensitive coating on the substrate to form a photosensitive layer;
(c) providing a mask to partially cover the photosensitive layer;
(d) irradiating the photosensitive layer with a radiation light to form at least one high water contact angle region and at least one low water contact angle region;
(e) removing the mask; and
(f) coating a conductive coating on the photosensitive layer to form a conductive layer having different thicknesses,
wherein the photosensitive coating comprises an organic compound with at least one photosensitive functional group, a solvent, and optionally an additive,
wherein the organic compound is selected from the group consisting of a cinnamate, an acrylate, and a mixture thereof,
wherein the cinnamate is selected from the group consisting of polyvinyl cinnamate, methyl 4-hydroxy cinnamate, polyvinyl 4-methoxy cinnamate, and a mixture thereof, and
wherein the acrylate is selected from the group consisting of 2-hydroxyethyl methacrylate, tripropylene glycol diacrylate, polyurethane acrylate, and a mixture thereof.

### Claim 2 (depends on 1)

The method according to claim 1, wherein the difference between the high water contact angle and the low water contact angle is between 5 degrees and 40 degrees.

### Claim 3 (depends on 1)

The method according to claim 1, wherein the mask covers 25% to 75% of the photosensitive layer.

### Claim 4 (depends on 1)

The method according to claim 1, wherein the conductive coating has a surface tension of between 15 dyne/cm and 40 dyne/cm.

### Claim 5 (depends on 1)

The method according to claim 1, wherein the radiation light is an ultraviolet light.

### Claim 6 (depends on 1)

The method according to claim 1, wherein a dosage of the irradiation light is in the range of 100 mJ/cm2 to 800 mJ/cm2 during irradiating the photosensitive layer in step (d).

### Claim 7 (depends on 1)

The method according to claim 1, wherein the additive is a photo initiator, a photo sensitizer, a photoacid generator, or a combination thereof.

### Claim 8

A method for preparing a transparent conductive film, comprising:
(a) providing a substrate;
(b)-coating a photosensitive coating on the substrate to form a photosensitive layer;
(c) providing a mask to partially cover the photosensitive layer;
(d) irradiating the photosensitive layer with a radiation light to form at least one high water contact angle region and at least one low water contact angle region;
(e) removing the mask; and
(f) coating a conductive coating on the photosensitive layer to form a conductive layer having different thicknesses,
wherein the photosensitive coating comprises an organic compound with at least one photosensitive functional group, a solvent, and optionally an additive,
and the organic compound is a cinnamate is selected from the group consisting of polyvinyl cinnamate, methyl 4-hydroxy cinnamate, polyvinyl 4-methoxy cinnamate, and a mixture thereof.

### Claim 9

A method for preparing a transparent conductive film, comprising:
(a) providing a substrate;
(b)-coating a photosensitive coating on the substrate to form a photosensitive layer;
(c) providing a mask to partially cover the photosensitive layer;
(d) irradiating the photosensitive layer with a radiation light to form at least one high water contact angle region and at least one low water contact angle region:
(e) removing the mask; and
(f) coating a conductive coating on the photosensitive layer to form a conductive layer having different thicknesses,
wherein the photosensitive coating comprises an organic compound with at least one photosensitive functional group, a solvent, and optionally an additive,
wherein the organic compound is an acrylate selected from the group consisting of 2-hydroxyethyl methacrylate, tripropylene glycol diacrylate, polyurethane acrylate, and a mixture thereof.
