Waferless auto conditioning
AssigneeLam Research Corporation
InventorsJoydeep Guha, Sanket Sant, Butsurin Jinnai
Life of this patent
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Abstract
A method for reducing contamination in an etch chamber is provided. A substrate with a metal containing layer is placed in the etch chamber. The metal containing layer is etched, producing nonvolatile metal residue deposits on surfaces of the etch chamber, wherein some of the metal residue of the metal residue deposits is in a first state. The substrate is removed from the etch chamber. The chamber is conditioned by converting metal residue in the first state to metal residue in a second state, where metal residue in the second state has stronger adhesion to surfaces of the etch chamber than metal residue in the first state.
Claims18
A method for reducing contamination in an etch chamber, comprising:
- placing a substrate with a metal containing layer in the etch chamber;
- etching the metal containing layer, producing nonvolatile metal residue deposits on surfaces of the etch chamber, wherein some of the metal residue of the metal residue is in a first state;
- removing the substrate from the etch chamber;
- and
- conditioning the chamber by converting metal residue in the first state to metal residue in a second state, where metal residue in the second state has stronger adhesion to surfaces of the etch chamber than metal residue in the first state,
- wherein the metal residue in the first state is at least one of metal nitrides or metal hydrides and wherein metal residue in the second state is a native state metal.
The method, as recited in 1, wherein the conditioning the chamber, comprises:
- providing an oxidation to convert the at least one of metal nitrides or metal hydrides to a metal oxide;
- and
- providing a reduction to convert the metal oxide to native state metal.
A method for reducing contamination in an etch chamber, comprising:
- placing a substrate with a metal containing layer in the etch chamber;
- etching the metal containing layer, producing nonvolatile metal residue deposits on surfaces of the etch chamber, wherein some of the metal residue of the metal residue is in a first state;
- removing the substrate from the etch chamber;
- and
- conditioning the chamber by converting metal residue in the first state to metal residue in a second state, where metal residue in the second state has stronger adhesion to surfaces of the etch chamber than metal residue in the first state,
- wherein the chamber has a power window and a Faraday shield, which reduces residue deposited on the power window,
- wherein the Faraday shield is grounded so that more residue is deposited on the Faraday shield than on the power window, and wherein the conditioning the chamber converts metal residue deposited on the Faraday shield to native state metal.
A method for reducing contamination in an etch chamber, comprising:
- placing a substrate with a metal containing layer in the etch chamber;
- etching the metal containing layer, producing nonvolatile metal residue deposits on surfaces of the etch chamber, wherein some of the metal residue of the metal residue is in a first state;
- removing the substrate from the etch chamber;
- and
- conditioning the chamber by converting metal residue in the first state to metal residue in a second state, where metal residue in the second state has stronger adhesion to surfaces of the etch chamber than metal residue in the first state, wherein the conditioning the chamber comprises providing an oxidation to convert the metal residue to a metal oxide and providing a reduction to convert the metal oxide to native state metal.
A method for reducing contamination in an etch chamber with a power window and a Faraday shield adjacent to the power window, comprising:
- placing a substrate with a metal containing layer in the etch chamber;
- etching the metal containing layer, producing nonvolatile metal residue deposits on surfaces of the etch chamber including the Faraday shield, wherein the metal residue comprises a metal hydride or metal nitride, wherein the etching comprises:
- providing a chemical reaction of the metal in the metal containing layer;
- and
- sputtering the chemically reacted metal in the metal containing layer;
- removing the substrate from the etch chamber;
- and
- conditioning the chamber by converting metal residue which comprises the metal hydride or a metal nitride to a native state metal, where native state metal has stronger adhesion to surfaces of the etch chamber than the metal hydride or metal nitride, comprising:
- providing an oxidation to convert the metal nitride or metal hydride to a metal oxide;
- and
- providing a reduction to convert the metal oxide to native state metal.
Dependencies are inferred from the claim text.