# US 8,784,675 B2 · Optical device, a method of manufacturing optical device, and exposure apparatus > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 8,784,675 B2 - Document ID: US8784675B2 - Status: Granted - Kind: B2 - Application number: 13/206,086 - Filed: 2011-08-09 - Published: 2012-04-05 - Granted: 2014-07-22 - Earliest claimed: 2010-09-30 - Assignees: Dainippon Screen Mfg. Co., Ltd. - Applicants: Masahide Okazaki; Toshiaki Suhara - Inventors: Masahide Okazaki; Toshiaki Suhara - Web page: https://patentgrep.com/patent/US8784675B2 ## CPC - G02F 1/3558: {Poled materials, e.g. with periodic poling; Fabrication of domain inverted structures, e.g. for quasi-phase-matching [QPM]} - G02F 1/292: {by controlled diffraction or phased-array beam steering (controlled diffraction for optical switching G02F1/31)} - G02F 1/2955: {by controlled diffraction or phased-array beam steering (controlled diffraction for optical waveguide switching G02F1/313)} - G02F 1/3775: {with a periodic structure, e.g. domain inversion, for quasi-phase-matching [QPM] (G02F1/383 takes precedence)} - G02F: OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS ## Abstract The ferroelectric substrate 11 of ferroelectric crystals, while being supported by the support plate 14 which is thicker than the ferroelectric substrate 11, is integrated with the support plate 14 by letting the junction 13 mediate between one major surface S1A of the ferroelectric substrate 11 and one major surface S1B of the support plate 14, and therefore, it is possible through the flat surface polishing to perform thinning of the ferroelectric substrate 11, namely, the ferroelectric crystals, and as a result, it is possible to obtain the thin periodically poled structure. By the voltage application method, the domain inverted region is formed in the ferroelectric substrate 11 which is made thin. ## Claims ### Claim 1 A manufacturing method of optical device, comprising: a first step of integrating a ferroelectric substrate formed by ferroelectric crystals with a support plate which is thicker than the ferroelectric substrate to support the ferroelectric substrate with the support plate by a conductive junction between one major surface of the ferroelectric substrate and one major surface of the support plate; a second step of forming a pattern electrode which has a periodic pattern on the other major surface of the ferroelectric substrate; and a third step of applying a voltage between the pattern electrode and the junction and forming a periodic domain inverted region in the ferroelectric substrate, wherein the first step comprises the steps of: forming a first insulation layer on one major surface of the ferroelectric substrate; forming a first metal layer on the first insulation layer; forming a second metal layer on one major surface of the support plate; and joining the first metal layer with the second metal layer and accordingly integrating the ferroelectric substrate with the support plate to support the ferroelectric substrate with the support plate. ### Claim 2 (depends on 1) The manufacturing method of optical device according to claim 1, further comprising: a fourth step of removing the pattern electrode; and a fifth step of forming a second insulation layer on the other major surface of the ferroelectric substrate from which the pattern electrode has been removed. ### Claim 3 (depends on 1) The manufacturing method of optical device according to claim 1, further comprising: a fourth step of removing the pattern electrode; and a fifth step of forming a proton exchanged waveguide in the vicinity of the other major surface of the ferroelectric substrate from which the pattern electrode has been removed. ### Claim 4 (depends on 1) The manufacturing method of optical device according to claim 1, wherein the first step comprises a step of forming a proton exchanged waveguide in the ferroelectric substrate before integrating the ferroelectric substrate with the support plate. ### Claim 5 (depends on 1) The manufacturing method of optical device according to claim 1, wherein the support plate is formed by the same liquid crystals as the ferroelectric crystals of the ferroelectric substrate, and at the first step, the support plate and the ferroelectric substrate are integrated with each other while matching the crystal orientations of the support plate and the ferroelectric substrate with each other. ### Claim 6 (depends on 1) The manufacturing method of optical device according to claim 1, further comprising a sixth step of removing a surface area of the other major surface of the ferroelectric substrate integrated with the support plate and accordingly adjusting the thickness of the ferroelectric crystals to 0.1 μm through 200 μm. ### Claim 7 A method of manufacturing optical device comprising a first step of integrating a ferroelectric substrate with a support plate to support the ferroelectric substrate with the support plate by a conductive junction between one major surface of the ferroelectric substrate and one major surface of the support plate, the ferroelectric substrate being formed by ferroelectric crystal having a periodically poled structure, the support plate being thicker than the ferroelectric substrate, wherein the first step comprises the steps of: forming a first insulation layer on one major surface of the ferroelectric substrate; forming a first metal layer on the first insulation layer; forming a second metal layer on one major surface of the support plate; and joining the first metal layer with the second metal layer and accordingly integrating the ferroelectric substrate with the support plate to support the ferroelectric substrate with the support plate. ### Claim 8 (depends on 7) The manufacturing method of optical device according to claim 7, further comprising a fourth step of forming a second insulation layer on the other major surface of the ferroelectric substrate. ### Claim 9 (depends on 7) The manufacturing method of optical device according to claim 7, further comprising a fourth step of forming a proton exchanged waveguide in the ferroelectric substrate.