# US 8,784,105 B2 · Method of fabricating implant with improved surface properties and implant fabricated by the same method > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 8,784,105 B2 - Document ID: US8784105B2 - Status: Granted - Kind: B2 - Application number: 12/452,181 - Filed: 2008-05-07 - Published: 2010-06-03 - Granted: 2014-07-22 - Earliest claimed: 2007-07-19 - Assignees: Osteoph I Co., Ltd. - Applicants: Jin Woo Park - Inventors: Jin Woo Park - Web page: https://patentgrep.com/patent/US8784105B2 ## CPC - A61C 8/0012: {characterised by the material or composition, e.g. ceramics, surface layer, metal alloy (use of specific materials A61K6/00)} - A61C 13/0003: {Making bridge-work, inlays, implants or the like} - A61C: DENTISTRY; APPARATUS OR METHODS FOR ORAL OR DENTAL HYGIENE (non-driven toothbrushes A46B; {tongue scrapers A61B17/24;} preparations for dentistry A61K6/00; preparations for cleaning the teeth or mouth A61K8/00, A61Q11/00) ## Abstract A method of fabricating an implant with improved surface properties and an implant fabricated using the same are provided. The method includes immersing a substrate that has titanium or titanium alloy in electrolytic solution including at least one of the group consisting of phosphate or fluoride ion and strontium ion, and forming an oxide film layer with a surface structure having a fine roughness of a micro scale by making at least one of phosphate or fluoride ion and strontium ion react to the titanium or the titanium alloy of the substrate on a surface of the immersed substrate using hydrothermal reaction associated with temperature, pressure and time conditions. ## Claims ### Claim 1 A method of fabricating an implant with improved surface properties comprising: pretreating a substrate to expose an uncovered outer surface having titanium or titanium alloy; immersing the substrate in an electrolytic solution comprising strontium ions to expose the titanium or titanium alloy to the strontium ions; and forming an oxide film layer at the outer surface of the substrate to achieve a surface structure having a fine roughness of a micro scale, said forming including reacting the strontium ions with the exposed titanium or the titanium alloy using a hydrothermal reaction associated with temperature, pressure and time conditions. ### Claim 2 (depends on 1) The method of claim 1, wherein the electrolytic solution further comprises phosphoric acid solution having a concentration of 0.1 wt/% or higher. ### Claim 3 (depends on 1) The method of claim 1, wherein the electrolytic solution further comprises fluoride ions prepared using hydrogen fluoride solution having a concentration of 0.01 wt % or higher. ### Claim 4 (depends on 1) The method of claim 1, wherein the electrolytic solution is prepared using strontium aqueous solution having a concentration of 0.001 mol/l or higher. ### Claim 5 (depends on 1) The method of claim 1, wherein the electrolytic solution further comprises mineralizer. ### Claim 6 (depends on 5) The method of claim 5, wherein the mineralizer comprises at least one of sodium hydroxide and potassium hydroxide. ### Claim 7 (depends on 5) The method of claim 5, wherein the concentration of the mineralizer is 0.1˜1 mol/l. ### Claim 8 (depends on 1) The method of claim 1, wherein the electrolytic solution further comprises at least one of calcium ion and magnesium ion. ### Claim 9 (depends on 8) The method of claim 8, wherein the electrolytic solution including the calcium ion and the magnesium ion is prepared using calcium solution and magnesium solution each having concentration of 0.001 mol/l or higher. ### Claim 10 (depends on 1) The method of claim 1, wherein the hydrothermal reaction is performed under a pressure of 1˜20 atm at a temperature of 100˜250° C. ### Claim 11 (depends on 10) The method of claim 10, wherein the hydrothermal reaction is performed for an hour or more. ### Claim 12 (depends on 1) The method of claim 1, further comprising performing thermal treatment after forming the oxide film layer. ### Claim 13 (depends on 12) The method of claim 12, wherein the thermal treatment is performed at a temperature of 300˜500° C. for an hour or more. ### Claim 14 (depends on 1) The method of claim 1, further comprising pretreatment of performing at least one of sandblasting, etching, cleaning, drying and preserving after conducting polishing the substrate before the immersing. ### Claim 15 (depends on 1) The method of claim 1, further comprising washing and drying after performing the forming of the oxide film layer. ### Claim 16 (depends on 1) The method of claim 1, wherein a surface roughness (Ra) value of the oxide film layer is 1˜5 μm. ### Claim 17 (depends on 1) An implant with improved surface properties produced by the method of claim 1, comprising: a substrate including titanium or a titanium alloy; and an oxide film layer provided directly on an outer surface of the substrate providing the implant with a surface structure having a fine roughness on a micro scale, and wherein the oxide film layer is configured at least in part with titanium or titanium alloy at the outer surface of the substrate reacted with strontium ions, so as to include at least one of the group consisting of strontium titanium and strontium titanium phosphate on a surface of the substrate. ### Claim 18 (depends on 17) The implant of claim 17, wherein the oxide film layer further comprises at least one of calcium ion and magnesium ion. ### Claim 19 (depends on 17) The implant of the claim 17, wherein a surface roughness (Ra) value of the oxide film layer is 1˜5 μm. ### Claim 20 (depends on 1) An implant with improved surface properties produced by the method of claim 1, comprising: a substrate including titanium or a titanium alloy; and an oxide film layer with a surface structure having a roughness in a micro unit and including at least one of strontium titanium and strontium titanium fluoride oxide. ### Claim 21 (depends on 20) The implant of claim 20, wherein the oxide film layer further comprises at least one of calcium ion and magnesium ion. ### Claim 22 (depends on 20) The implant of claim 20, wherein a surface roughness (Ra) value of the oxide film layer is 1˜5 μm. ### Claim 23 (depends on 1) The method of claim 1, wherein said forming the oxide film layer consists of applying a prescribed pressure and temperature for a prescribed time period while the substrate is immersed in the electrolyte solution to enact said hydrothermal reaction between the exposed titanium or titanium alloy at the outer surface of the substrate and the electrolytic solution. ### Claim 24 (depends on 23) The method of claim 23, wherein the hydrothermal reaction is performed under a pressure of 1˜20 atm at a temperature of 100˜250° C. for at least one hour. ### Claim 25 (depends on 1) The method of claim 1, wherein said forming the oxide film layer consists of: applying a pressure of 1˜20 atm for at least one hour while the substrate is immersed in the electrolyte solution; and performing thermal treatment after said applying, wherein the thermal treatment is performed at a temperature of 300˜500° C. for at least one hour; and wherein said hydrothermal reaction consists of said applying and said performing.