# US 8,783,728 B2 · Endless material for security elements

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- Number: US 8,783,728 B2
- Document ID: US8783728B2
- Status: Granted
- Kind: B2
- Application number: 12/601,590
- Filed: 2008-05-27
- Published: 2010-07-29
- Granted: 2014-07-22
- Earliest claimed: 2007-06-01
- Assignees: Giesecke & Devrient GmbH
- Applicants: Wittich Kaule; Wolfgang Rauscher; Marius Dichtl
- Inventors: Wittich Kaule; Wolfgang Rauscher; Marius Dichtl
- Web page: https://patentgrep.com/patent/US8783728B2

## CPC

- D05B 93/00: Stitches; Stitch seams
- B41F 19/062: {Presses of the rotary type}
- B42D 25/342: Moiré effects
- B42D 25/355: Security threads
- B41M 3/14: Security printing {(securities B42D25/29)}
- B42D 25/324: Reliefs
- B42D 2035/44
- Y10T 83/0538: Repetitive transverse severing from leading edge of work
- Y10T 428/24479: including variation in thickness
- Y10T 428/24802: Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]
- D05B: SEWING (appliances for the tailoring trade A41H; sewing tables A47B29/00; sewing in bookbinding B42B2/00; sewing machines modified for knitting D04B39/08)
- B41F: PRINTING MACHINES OR PRESSES (manifolding devices or office printing machines B41L)
- B42D: BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
- B41M: PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING, (correction of typographical errors B41J; processes for applying transfer pictures or the like B44C1/16; fluid media for correction of typographical errors by coating C09D10/00; printing textiles D06P)
- Y10T: TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION

## Abstract

An anti-counterfeit printed matter forming an invisible image that can be visualized clearly and prevents a visible image from impeding visibility of a visualized invisible image. In the anti-counterfeit printed matter according to this invention, a plurality of object elements are arranged at a predetermined pitch in a matrix, each object element including a first and second object arranged along a first direction on both sides of a boundary at a center, opposing each other, and third and fourth objects arranged along a second direction perpendicular to the first direction on both sides of a boundary at the center, opposing each other. The first object and the second object, and the third object and the fourth object of each object element have a negative/positive relationship. The first object and/or the second object forms a first invisible image. The third object and/or the fourth object forms a second invisible image.

## Claims

### Claim 1

A method for manufacturing endless material for security elements having micro-optical moiré magnification arrangements that exhibit a motif grid comprising a plurality of micromotif elements and a focusing element grid comprising a plurality of microfocusing elements for moiré-magnified viewing of the micromotif elements, the method comprising:
a) providing a motif grid comprising an at least locally periodic arrangement of micromotif elements in the form of a first one- or two-dimensional lattice,
b) providing a focusing element grid comprising an at least locally periodic arrangement of a plurality of microfocusing elements in the form of a second one- or two-dimensional lattice,
c) specifying a pattern repeat of the motif grid and/or of the focusing element grid on the endless material,
d) determining whether the lattice of the motif grid and/or the lattice of the focusing element grid repeats periodically in the specified pattern repeat, and if not, determining a linear transformation that distorts the first and/or the second lattice such that it repeats periodically in the specified pattern repeat, and
e) for the further manufacture of the endless material, replacing the motif grid or the focusing element grid by the motif grid that is distorted by the determined linear transformation, or the focusing element grid that is distorted by the determined linear transformation,
wherein, in step c), a pattern repeat q along the endless longitudinal direction of the endless material is specified,
wherein, in step d), a lattice point P of the first and/or the second lattice is selected that lies near an endpoint Q of a vector
(
0
q
)
given by the longitudinal pattern repeat, and a linear transformation V is determined that maps P to Q.

### Claim 2 (depends on 1)

The method according to claim 1, wherein the longitudinal pattern repeat q is given by the circumference of an embossing or impression cylinder for producing the motif grid and/or the focusing element grid.

### Claim 3 (depends on 1)

The method according to claim 1, wherein, as the lattice point lying near the endpoint Q, a lattice point P is chosen whose distance from Q along the lattice vector or both lattice vectors is in each case less than 10 lattice periods.

### Claim 4 (depends on 1)

The method according to claim 1, wherein the lattice point closest to the endpoint Q is chosen as the lattice point P.

### Claim 5 (depends on 1)

The method according to claim 1, wherein the linear transformation V is calculated using the relationship
V
=
(
b
x
0
b
y
q
)
·
(
a
x
p
x
a
y
p
y
)
-
1
,
wherein
(
p
x
p
y
)
⁢
⁢
and
⁢
⁢
(
0
q
)
represent the coordinate vectors of the lattice point P and the endpoint Q, and
b
->
=
(
b
x
b
y
)
⁢
⁢
and
⁢
⁢
a
->
=
(
a
x
a
y
)
arbitrary vectors.

### Claim 6 (depends on 1)

The method according to claim 1, wherein the linear transformation V is calculated using the relationship
V
=
(
1
0
0
q
)
·
(
1
p
x
0
p
y
)
-
1
=
(
1
-
p
x
/
p
y
0
q
/
p
y
)
,
wherein
(
p
x
p
y
)
⁢
⁢
and
⁢
⁢
(
0
q
)
represent the coordinate vectors of the lattice point P and the endpoint Q.

### Claim 7

A method for manufacturing endless material for security elements having micro-optical moiré magnification arrangements that exhibit a motif grid comprising a plurality of micromotif elements and a focusing element grid comprising a plurality of microfocusing elements for moiré-magnified viewing of the micromotif elements, the method comprising:
a) providing a motif grid comprising an at least locally periodic arrangement of micromotif elements in the form of a first one- or two-dimensional lattice,
b) providing a focusing element grid comprising an at least locally periodic arrangement of a plurality of microfocusing elements in the form of a second one- or two-dimensional lattice,
c) specifying a pattern repeat of the motif grid and/or of the focusing element grid on the endless material,
d) determining whether the lattice of the motif grid and/or the lattice of the focusing element grid repeats periodically in the specified pattern repeat, and if not, determining a linear transformation that distorts the first and/or the second lattice such that it repeats periodically in the specified pattern repeat, and
e) for the further manufacture of the endless material, replacing the motif grid or the focusing element grid by the motif grid that is distorted by the determined linear transformation, or the focusing element grid that is distorted by the determined linear transformation,
wherein, in step c), a pattern repeat q along the endless longitudinal direction of the endless material is specified,
wherein, in step c), a pattern repeat b along the transverse direction of the endless material is specified,
wherein, in step d),
a lattice point P of the first and/or the second lattice is selected that lies near the endpoint Q of the vector
(
0
q
)
given by the longitudinal pattern repeat,
a lattice point A of the first and/or the second lattice is selected that lies near the endpoint B of the vector
(
b
0
)
given by the transverse pattern repeat, and
a linear transformation V is determined that maps P to Q and A to B.

### Claim 8 (depends on 7)

The method according to claim 7, further comprising cutting the endless material into parallel longitudinal strips, wherein the transverse pattern repeat b is given by the width of these longitudinal strips.

### Claim 9 (depends on 7)

The method according to claim 7, wherein, as the lattice points lying near the endpoints Q and B, such lattice points P and A are chosen whose distances from Q and B along the lattice vector or both lattice vectors is in each case less than 10 lattice periods.

### Claim 10 (depends on 7)

The method according to claim 7, wherein the lattice point closest to the endpoint Q is chosen as the lattice point P, and the lattice point closest to the endpoint B as the lattice point A.

### Claim 11 (depends on 7)

The method according to claim 7, wherein the linear transformation V is calculated using the relationship
V
=
(
b
0
0
q
)
·
(
a
x
p
x
a
y
p
y
)
-
1
,
wherein
(
p
x
p
y
)
⁢
⁢
and
⁢
⁢
(
0
q
)
represent the coordinate vectors of the lattice point P and the endpoint Q, and
(
a
x
a
y
)
⁢
⁢
and
⁢
⁢
(
b
0
)
the coordinate vectors of the lattice point A and the endpoint B.

### Claim 12

A method for manufacturing endless material for security elements having micro-optical moiré magnification arrangements that exhibit a motif grid comprising a plurality of micromotif elements and a focusing element grid comprising a plurality of microfocusing elements for moiré-magnified viewing of the micromotif elements, the method comprising:
a) providing a motif grid comprising an at least locally periodic arrangement of micromotif elements in the form of a first one- or two-dimensional lattice,
b) providing a focusing element grid comprising an at least locally periodic arrangement of a plurality of microfocusing elements in the form of a second one- or two-dimensional lattice,
c) specifying a pattern repeat of the motif grid and/or of the focusing element grid on the endless material,
d) determining whether the lattice of the motif grid and/or the lattice of the focusing element grid repeats periodically in the specified pattern repeat, and if not, determining a linear transformation that distorts the first and/or the second lattice such that it repeats periodically in the specified pattern repeat, and
e) for the further manufacture of the endless material, replacing the motif grid or the focusing element grid by the motif grid that is distorted by the determined linear transformation, or the focusing element grid that is distorted by the determined linear transformation,
wherein the first and second lattice are one-dimensional translation lattices.

### Claim 13

A method for manufacturing endless material for security elements having micro-optical moiré magnification arrangements that exhibit a motif grid comprising a plurality of micromotif elements and a focusing element grid comprising a plurality of microfocusing elements for moiré-magnified viewing of the micromotif elements, the method comprising:
a) providing a motif grid comprising an at least locally periodic arrangement of micromotif elements in the form of a first one- or two-dimensional lattice,
b) providing a focusing element grid comprising an at least locally periodic arrangement of a plurality of microfocusing elements in the form of a second one- or two-dimensional lattice,
c) specifying a pattern repeat of the motif grid and/or of the focusing element grid on the endless material,
d) determining whether the lattice of the motif grid and/or the lattice of the focusing element grid repeats periodically in the specified pattern repeat, and if not, determining a linear transformation that distorts the first and/or the second lattice such that it repeats periodically in the specified pattern repeat, and
e) for the further manufacture of the endless material, replacing the motif grid or the focusing element grid by the motif grid that is distorted by the determined linear transformation, or the focusing element grid that is distorted by the determined linear transformation,
wherein the first and second lattice are two-dimensional Bravais lattices,
the method further comprising:
defining a desired image that is visible when viewed and has one or more moiré image elements, the arrangement of magnified moiré image elements being chosen in the form of a two-dimensional Bravais lattice whose lattice cells are given by vectors {right arrow over (t)}1 and {right arrow over (t)}2,
providing the focusing element grid in step b) as an arrangement of microfocusing elements in the form of a two-dimensional Bravais lattice whose lattice cells are given by vectors {right arrow over (w)}1 and {right arrow over (w)}2, and
in step a), calculating the motif grid having the micromotif elements using the relationships
U
↔
=
W
↔
·
(
T
↔
+
W
↔
)
-
1
·
T
↔
and
r
->
=
W
↔
·
(
T
↔
+
W
↔
)
-
1
·
R
->
+
r
->
0
,
wherein
R
->
=
(
X
Y
)
represents an image point of the desired image,
r
->
=
(
x
y
)
an image point of the motif grid,
r
->
0
=
(
x
0
y
0
)
a displacement between the arrangement of microfocusing elements and the arrangement of micromotif elements, and the matrices , and are given by
T
↔
=
(
t
11
t
12
t
21
t
22
)
,
W
↔
=
(
w
11
w
12
w
21
w
22
)
⁢
⁢
and
⁢
⁢
U
↔
=
(
u
11
u
12
u
21
u
22
)
,
with t1i, t2i, u1i, u2i and w1i, w2i representing the components of the lattice cell vectors , {right arrow over (u)}i and {right arrow over (w)}i, where i=1, 2.

### Claim 14

A method for manufacturing endless material for security elements having micro-optical moiré magnification arrangements that exhibit a motif grid comprising a plurality of micromotif elements and a focusing element grid comprising a plurality of microfocusing elements for moiré-magnified viewing of the micromotif elements, the method comprising:
a) providing a motif grid comprising an at least locally periodic arrangement of micromotif elements in the form of a first one- or two-dimensional lattice,
b) providing a focusing element grid comprising an at least locally periodic arrangement of a plurality of microfocusing elements in the form of a second one- or two-dimensional lattice,
c) specifying a pattern repeat of the motif grid and/or of the focusing element grid on the endless material,
d) determining whether the lattice of the motif grid and/or the lattice of the focusing element grid repeats periodically in the specified pattern repeat, and if not, determining a linear transformation that distorts the first and/or the second lattice such that it repeats periodically in the specified pattern repeat, and
e) for the further manufacture of the endless material, replacing the motif grid or the focusing element grid by the motif grid that is distorted by the determined linear transformation, or the focusing element grid that is distorted by the determined linear transformation,
wherein the first and second lattice are two-dimensional Bravais lattices,
the method further comprising:
defining a desired image that is visible when viewed and has one or more moiré image elements,
providing the focusing element grid in step b) as an arrangement of microfocusing elements in the form of a two-dimensional Bravais lattice whose lattice cells are given by vectors {right arrow over (w)}1 and {right arrow over (w)}2,
defining a desired movement of the visible image when the moiré magnification arrangement is tilted laterally and when tilted forward and back, the desired movement being specified in the form of the matrix elements of a transformation matrix, , and
in step a), calculating the motif grid having the micromotif elements using the relationships
U
↔
=
(
I
↔
-
A
↔
-
1
)
·
W
↔
and
r
↔
=
A
↔
-
1
·
R
->
+
r
->
0
,
wherein
R
->
=
(
X
Y
)
represents an image point of the desired image,
r
->
=
(
x
y
)
an image point of the motif image,
r
->
=
(
x
0
y
0
)
a displacement between the arrangement of microfocusing elements and the arrangement of micromotif elements, and the matrices , and are given by
A
↔
=
(
a
11
a
12
a
21
a
22
)
,
W
↔
=
(
w
11
w
12
w
21
w
22
)
⁢
⁢
and
⁢
⁢
U
↔
=
(
u
11
u
12
u
21
u
22
)
,
with u1i, u2i and w1i, w2i representing the components of the lattice cell vectors {right arrow over (u)}i and {right arrow over (w)}i, where i=1, 2.

### Claim 15 (depends on 1)

The method according to claim 1, wherein the motif grid and the focusing element grid are arranged at opposing surfaces of an optical spacing layer.

### Claim 16 (depends on 1)

The method according to claim 1, wherein step e) comprises providing an impression or embossing cylinder with the distorted focusing element grid.

### Claim 17 (depends on 16)

The method according to claim 16, wherein, in step e), a flat plate is provided with the distorted focusing element grid, and the flat plate or a flat casting of the plate is fitted on an impression or embossing cylinder such that a cylinder having seams is created having a cylinder circumference q.

### Claim 18 (depends on 16)

The method according to claim 16, wherein, in step e), a coated cylinder having a cylinder circumference q is provided with the distorted focusing element grid through a material-ablation process, especially through laser ablation.

### Claim 19 (depends on 1)

The method according to claim 1, wherein step e) comprises embossing the distorted focusing element grid in an embossable lacquer layer.

### Claim 20 (depends on 1)

The method according to claim 1, wherein step e) comprises providing an impression or embossing cylinder with the distorted motif grid.

### Claim 21 (depends on 20)

The method according to claim 20, wherein, in step e), a flat plate is provided with the distorted motif grid, and the flat plate or a flat casting of the plate is fitted on an impression or embossing cylinder such that a cylinder having seams is created having a cylinder circumference q.

### Claim 22 (depends on 20)

The method according to claim 20, wherein, in step e), a coated cylinder having a cylinder circumference q is provided with the distorted motif grid through a material-ablation process, especially through laser ablation.

### Claim 23 (depends on 1)

The method according to claim 1, wherein step e) comprises embossing the distorted motif grid in an embossable lacquer layer.

### Claim 24 (depends on 1)

The method according to claim 1, wherein step e) comprises imprinting the distorted motif grid on a substrate layer, especially on an optical spacing layer.

### Claim 25 (depends on 7)

The method according to claim 7, wherein the motif grid and the focusing element grid are arranged at opposing surfaces of an optical spacing layer.

### Claim 26 (depends on 7)

The method according to claim 7, wherein step e) comprises providing an impression or embossing cylinder with the distorted focusing element grid.

### Claim 27 (depends on 26)

The method according to claim 26, wherein, in step e), a flat plate is provided with the distorted focusing element grid, and the flat plate or a flat casting of the plate is fitted on an impression or embossing cylinder such that a cylinder having seams is created having a cylinder circumference q.

### Claim 28 (depends on 26)

The method according to claim 26, wherein, in step e), a coated cylinder having a cylinder circumference q is provided with the distorted focusing element grid through a material-ablation process, especially through laser ablation.

### Claim 29 (depends on 7)

The method according to claim 7, wherein step e) comprises embossing the distorted focusing element grid in an embossable lacquer layer.

### Claim 30 (depends on 7)

The method according to claim 7, wherein step e) comprises providing an impression or embossing cylinder with the distorted motif grid.

### Claim 31 (depends on 30)

The method according to claim 30, wherein, in step e), a flat plate is provided with the distorted motif grid, and the flat plate or a flat casting of the plate is fitted on an impression or embossing cylinder such that a cylinder having seams is created having a cylinder circumference q.

### Claim 32 (depends on 30)

The method according to claim 30, wherein, in step e), a coated cylinder having a cylinder circumference q is provided with the distorted motif grid through a material-ablation process, especially through laser ablation.

### Claim 33 (depends on 7)

The method according to claim 7, wherein step e) comprises embossing the distorted motif grid in an embossable lacquer layer.

### Claim 34 (depends on 7)

The method according to claim 7, wherein step e) comprises imprinting the distorted motif grid on a substrate layer, especially on an optical spacing layer.

### Claim 35 (depends on 12)

The method according to claim 12, wherein the motif grid and the focusing element grid are arranged at opposing surfaces of an optical spacing layer.

### Claim 36 (depends on 12)

The method according to claim 12, wherein step e) comprises providing an impression or embossing cylinder with the distorted focusing element grid.

### Claim 37 (depends on 36)

The method according to claim 36, wherein, in step e), a flat plate is provided with the distorted focusing element grid, and the flat plate or a flat casting of the plate is fitted on an impression or embossing cylinder such that a cylinder having seams is created having a cylinder circumference q.

### Claim 38 (depends on 36)

The method according to claim 36, wherein, in step e), a coated cylinder having a cylinder circumference q is provided with the distorted focusing element grid through a material-ablation process, especially through laser ablation.

### Claim 39 (depends on 12)

The method according to claim 12, wherein step e) comprises embossing the distorted focusing element grid in an embossable lacquer layer.

### Claim 40 (depends on 12)

The method according to claim 12, wherein step e) comprises providing an impression or embossing cylinder with the distorted motif grid.

### Claim 41 (depends on 40)

The method according to claim 40, wherein, in step e), a flat plate is provided with the distorted motif grid, and the flat plate or a flat casting of the plate is fitted on an impression or embossing cylinder such that a cylinder having seams is created having a cylinder circumference q.

### Claim 42 (depends on 40)

The method according to claim 40, wherein, in step e), a coated cylinder having a cylinder circumference q is provided with the distorted motif grid through a material-ablation process, especially through laser ablation.

### Claim 43 (depends on 12)

The method according to claim 12, wherein step e) comprises embossing the distorted motif grid in an embossable lacquer layer.

### Claim 44 (depends on 12)

The method according to claim 12, wherein step e) comprises imprinting the distorted motif grid on a substrate layer, especially on an optical spacing layer.

### Claim 45 (depends on 13)

The method according to claim 13, wherein the vectors {right arrow over (u)}1 and {right arrow over (u)}2, and {right arrow over (w)}1 and {tilde over (w)}2 are modulated location-dependently, the local period parameters |{right arrow over (u)}1|, |{right arrow over (u)}2|, ∠({right arrow over (u)}1, {right arrow over (u)}2) and |{right arrow over (w)}1|, |{right arrow over (w)}2|, ∠({right arrow over (w)}1, {right arrow over (w)}2) changing only slowly in relation to the periodicity length.

### Claim 46 (depends on 13)

The method according to claim 13, wherein the motif grid and the focusing element grid are arranged at opposing surfaces of an optical spacing layer.

### Claim 47 (depends on 13)

The method according to claim 13, wherein step e) comprises providing an impression or embossing cylinder with the distorted focusing element grid.

### Claim 48 (depends on 47)

The method according to claim 47, wherein, in step e), a flat plate is provided with the distorted focusing element grid, and the flat plate or a flat casting of the plate is fitted on an impression or embossing cylinder such that a cylinder having seams is created having a cylinder circumference q.

### Claim 49 (depends on 47)

The method according to claim 47, wherein, in step e), a coated cylinder having a cylinder circumference q is provided with the distorted focusing element grid through a material-ablation process, especially through laser ablation.

### Claim 50 (depends on 13)

The method according to claim 13, wherein step e) comprises embossing the distorted focusing element grid in an embossable lacquer layer.

### Claim 51 (depends on 13)

The method according to claim 13, wherein step e) comprises providing an impression or embossing cylinder with the distorted motif grid.

### Claim 52 (depends on 51)

The method according to claim 51, wherein, in step e), a flat plate is provided with the distorted motif grid, and the flat plate or a flat casting of the plate is fitted on an impression or embossing cylinder such that a cylinder having seams is created having a cylinder circumference q.

### Claim 53 (depends on 51)

The method according to claim 51, wherein, in step e), a coated cylinder having a cylinder circumference q is provided with the distorted motif grid through a material-ablation process, especially through laser ablation.

### Claim 54 (depends on 13)

The method according to claim 13, wherein step e) comprises embossing the distorted motif grid in an embossable lacquer layer.

### Claim 55 (depends on 13)

The method according to claim 13, wherein step e) comprises imprinting the distorted motif grid on a substrate layer, especially on an optical spacing layer.

### Claim 56 (depends on 14)

The method according to claim 14, wherein the vectors {right arrow over (u)}1 and {right arrow over (u)}2, and {right arrow over (w)}1 and {right arrow over (w)}2 are modulated location-dependently, the local period parameters |{right arrow over (u)}1|, |{right arrow over (u)}2|, ∠({right arrow over (u)}1, {right arrow over (u)}2) and |{right arrow over (w)}1|, |{right arrow over (w)}2|, ∠({right arrow over (w)}1, {right arrow over (w)}2) changing only slowly in relation to the periodicity length.

### Claim 57 (depends on 14)

The method according to claim 14, wherein the motif grid and the focusing element grid are arranged at opposing surfaces of an optical spacing layer.

### Claim 58 (depends on 14)

The method according to claim 14, wherein step e) comprises providing an impression or embossing cylinder with the distorted focusing element grid.

### Claim 59 (depends on 58)

The method according to claim 58, wherein, in step e), a flat plate is provided with the distorted focusing element grid, and the flat plate or a flat casting of the plate is fitted on an impression or embossing cylinder such that a cylinder having seams is created having a cylinder circumference q.

### Claim 60 (depends on 58)

The method according to claim 58, wherein, in step e), a coated cylinder having a cylinder circumference q is provided with the distorted focusing element grid through a material-ablation process, especially through laser ablation.

### Claim 61 (depends on 14)

The method according to claim 14, wherein step e) comprises embossing the distorted focusing element grid in an embossable lacquer layer.

### Claim 62 (depends on 14)

The method according to claim 14, wherein step e) comprises providing an impression or embossing cylinder with the distorted motif grid.

### Claim 63 (depends on 62)

The method according to claim 62, wherein, in step e), a flat plate is provided with the distorted motif grid, and the flat plate or a flat casting of the plate is fitted on an impression or embossing cylinder such that a cylinder having seams is created having a cylinder circumference q.

### Claim 64 (depends on 62)

The method according to claim 62, wherein, in step e), a coated cylinder having a cylinder circumference q is provided with the distorted motif grid through a material-ablation process, especially through laser ablation.

### Claim 65 (depends on 14)

The method according to claim 14, wherein step e) comprises embossing the distorted motif grid in an embossable lacquer layer.

### Claim 66 (depends on 14)

The method according to claim 14, wherein step e) comprises imprinting the distorted motif grid on a substrate layer, especially on an optical spacing layer.