# US 8,783,095 B2 · Ultrapure water production facility and method of monitoring ultrapure water

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- Number: US 8,783,095 B2
- Document ID: US8783095B2
- Status: Granted
- Kind: B2
- Application number: 13/138,656
- Filed: 2010-03-29
- Published: 2012-03-08
- Granted: 2014-07-22
- Earliest claimed: 2009-03-31
- Assignees: Kurita Water Industries Ltd.
- Applicants: Hiroto Tokoshima; Hideki Kobayashi
- Inventors: Hiroto Tokoshima; Hideki Kobayashi
- Web page: https://patentgrep.com/patent/US8783095B2

## CPC

- C02F 1/008: {Control or steering systems not provided for elsewhere in subclass C02F}
- G01N 33/18: Water
- C02F 1/006: {Water distributors either inside a treatment tank or directing the water to several treatment tanks; Water treatment plants incorporating these distributors, with or without chemical or biological tanks (for settling tanks B01D21/24)}
- C02F 2103/04: for obtaining ultra-pure water
- C02F 2209/02: Temperature
- C02F 2209/04: Oxidation reduction potential [ORP]
- C02F 2209/05: Conductivity or salinity
- C02F 2209/11: Turbidity
- C02F 2209/14: NH3-N
- C02F 2209/20: Total organic carbon [TOC]
- C02F 2209/22: O2
- G01N 33/1846: {Total carbon analysis}
- Y02A 20/20: Controlling water pollution; Waste water treatment
- Y10T 137/0318: Processes
- Y10T 137/8593: Systems
- C02F: TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE (separation in general B01D; special arrangements on waterborne vessels of installations for treating water, waste water or sewage, e.g. for producing fresh water, B63J; adding materials to water to prevent corrosion C23F; treating radioactively-contaminated liquids G21F9/04; regeneration of reactants for recirculation into processes, see the relevant places for the processes)
- G01N: INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES (measuring or testing apparatus or processes other than immunoassay, involving enzymes or microorganisms C12M, C12Q)
- Y02A: TECHNOLOGIES FOR ADAPTATION TO CLIMATE CHANGE
- Y10T: TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION

## Abstract

An ultrapure water production facility and a method of monitoring ultrapure water include an ultrapure water production system, a first monitoring unit including a resistivity meter, a second monitoring unit including a dissolved gas concentration meter, a TOC meter, a hydrogen peroxide concentration meter, a silica meter, a boron meter, an evaporation residue meter, and a water temperature meter connected in parallel, and a third monitoring unit including a particle meter. The third monitoring unit is provided in parallel with the first monitoring unit and the first monitoring unit and the second monitoring unit are connected in series.

## Claims

### Claim 1

An ultrapure water production facility, comprising:
an ultrapure water production system;
a supply pipe for supplying ultrapure water produced in the ultrapure water production system to a use point; and
a monitoring system for monitoring a quality of the ultrapure water extracted from the supply pipe, comprising
a first monitoring unit including a resistivity meter,
a second monitoring unit in which one type or two or more types of measuring instrument, selected from the group consisting of a dissolved gas concentration meter, a TOC meter, a hydrogen peroxide concentration meter, a silica meter, a boron meter, an evaporation residue meter, and a water temperature meter, are connected in parallel,
a third monitoring unit including a particle meter, the third monitoring unit being provided in parallel with the first monitoring unit and the second monitoring unit,
a transportation pipe for introducing a portion of monitoring wastewater discharged from the first monitoring unit into the second monitoring unit, and
a discharging pipe for discharging the remaining of the monitoring wastewater,
wherein the first monitoring unit and the second monitoring unit are connected in series.

### Claim 2 (depends on 1)

The ultrapure water production facility according to claim 1, further comprising a circulation pipe for circulating the monitoring wastewater discharged from the discharging pipe as raw water through the ultrapure water production system.

### Claim 3

A method of monitoring ultrapure water in which a portion of ultrapure water supplied from a production system to a use point is separated and a water quality thereof is monitored,
wherein the separated ultrapure water is allowed to pass through a monitoring system comprising
a first monitoring unit including a resistivity meter,
a second monitoring unit in which one type or two or more types of measuring instruments, selected from the group consisting of a dissolved gas concentration meter, a TOC meter, a hydrogen peroxide concentration meter, a silica meter, a boron meter, an evaporation residue meter, and a water temperature meter, are connected in parallel,
a third monitoring unit including a particle meter, the third monitoring unit being provided in parallel with the first monitoring unit and the second monitoring unit,
a transportation pipe for introducing a portion of monitoring wastewater discharged from the first monitoring unit into the second monitoring unit, and
a discharging pipe for discharging the remaining of the monitoring wastewater, and
the first monitoring unit and the second monitoring unit are connected in series so that the water quality is monitored.

### Claim 4 (depends on 3)

The method of monitoring ultrapure water according to claim 3, wherein the monitoring wastewater discharged from the discharging pipe is circulated and used as raw water through the ultrapure water production system.

### Claim 5

An ultrapure water production facility, comprising:
an ultrapure water production system producing an ultrapure water;
a use point where the ultrapure water is used for a predetermined usage;
a supply pipe supplying the ultrapure water to the use point from the ultrapure water production system;
a first monitoring unit including a resistivity meter;
a second monitoring unit in which at least one measuring instrument selected from the group consisting of a dissolved gas concentration meter, a TOC meter, a hydrogen peroxide concentration meter, a silica meter, a boron meter, an evaporation residue meter, and a water temperature meter is connected in parallel, the second monitoring unit being provided in series with the first monitoring unit;
a third monitoring unit including a particle meter, the third monitoring unit being provided in parallel with the first monitoring unit and the second monitoring unit;
an extracting pipe branching off from the supply pipe, separating a monitoring water from the ultrapure water, and supplying the monitoring water to the first monitoring unit and third monitoring unit;
a transportation pipe introducing a portion of the monitoring water discharged from the first monitoring unit into the second monitoring unit; and
a discharging pipe discharging a remaining of the monitoring water not introduced to the second monitoring unit, to the ultrapure water production system.

### Claim 6 (depends on 5)

The ultrapure water production facility according to claim 5, further comprising another discharging pipe discharging the monitoring water discharged from the second monitoring unit to an outside of the ultrapure water production system.

### Claim 7 (depends on 6)

The ultrapure water production facility according to claim 6, wherein, in the second monitoring unit, the dissolved gas concentration meter, the TOC meter, the hydrogen peroxide concentration meter, the silica meter, the boron meter, the evaporation residue meter, and the water temperature meter are arranged in parallel.

### Claim 8 (depends on 6)

The ultrapure water production facility according to claim 6, wherein the monitoring water supplied to the third monitoring unit is discharged from the another discharging pipe.