Method for manufacturing porous structure and method for forming pattern
AssigneeKabushiki Kaisha Toshiba
InventorsKoji Asakawa, Toshiro Hiraoka, Yoshihiro Akasaka, Yasuyuki Hotta
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Abstract
A pattern forming material contains a block copolymer or graft copolymer and forms a structure having micro polymer phases, in which, with respect to at least two polymer chains among polymer chains constituting the block copolymer or graft copolymer, the ratio between N/(Nc−No) values of monomer units constituting respective polymer chains is 1.4 or more, where N represents total number of atoms in the monomer unit, Nc represents the number of carbon atoms in the monomer unit, No represents the number of oxygen atoms in the monomer unit.
Claims8
A method for forming a pattern comprising:
- forming a pattern transfer film on a substrate;
- forming a film made of a pattern forming material comprising a block copolymer or graft copolymer having two polymer chains whose ratio between dry etching rates is 1.3 or more on the pattern transfer film;
- annealing the film to form a microphase-separated structure in the film;
- ion-etching the film to selectively remove a polymer phase from the microphase-separated structure formed in the film;
- etching the pattern transfer film by using remaining another polymer phase as a mask, thereby transferring the pattern of the microphase-separated structure to the pattern transfer film;
- and
- etching the substrate by using the pattern transfer film as a mask in which the microphase-separated structure is transferred, thereby transferring the pattern of the microphase-separated structure to the substrate,
- wherein the ion-etching is performed with Ar, O2, CF4, H2, C2F6, CHF3, CH2F2, CF3Br, N2, NF3, Cl2, CCl4, HBr, or SF6.
A method for forming a pattern comprising:
- forming a pattern transfer film on a substrate;
- forming a film made of a pattern forming material on the pattern transfer film, wherein the pattern forming material comprises a block copolymer or a graft copolymer, wherein the block copolymer or the graft copolymer comprises two polymer chains having a ratio between dry etching rates of 1.3 or more and having a ratio between N/(Nc−No) values of respective monomer units of 1.4 or more, where N represents total number of atoms in the monomer unit, Nc represents a number of carbon atoms in the monomer unit, No represents a number of oxygen atoms in the monomer unit;
- annealing the film to form a microphase-separated structure in the film;
- ion-etching the film to selectively remove a polymer phase from the microphase-separated structure formed in the film;
- etching the pattern transfer film with a remaining another polymer phase as a mask, thereby transferring the pattern of the microphase-separated structure to the pattern transfer film;
- and
- etching the substrate with the pattern transfer film as a mask in which the microphase-separated structure is transferred, thereby transferring the pattern of the microphase-separated structure to the substrate.
Dependencies are inferred from the claim text.