# US 8,772,737 B2 · Conductive element for electrically coupling an EUVL mask to a supporting chuck > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 8,772,737 B2 - Document ID: US8772737B2 - Status: Granted - Kind: B2 - Application number: 13/623,804 - Filed: 2012-09-20 - Published: 2013-03-28 - Granted: 2014-07-08 - Earliest claimed: 2011-09-27 - Assignees: Applied Materials Israel Ltd. - Applicants: Applied Materials Israel, Ltd. - Inventors: Igor Krivts (Krayvitz); Israel Avneri; Yoram Uziel; Nir Ben-David Dodzin; Ido Holcman; Itzak Yair; Yosi Basson - Web page: https://patentgrep.com/patent/US8772737B2 ## CPC - H01J 37/20: Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support - G03F 1/22: Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof - G03F 1/40: Electrostatic discharge [ESD] related features, e.g. antistatic coatings or a conductive metal layer around the periphery of the mask substrate - H10P 72/72: using electrostatic chucks - G01N 23/18: Investigating the presence of flaws defects or foreign matter - H01J 2237/0044: of objects being observed or treated - H01J 2237/20: Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated - H01J 2237/2008: specially adapted for studying electrical or magnetical properties of objects - Y10T 279/23: with magnetic or electrostatic means - Y10T 403/70: Interfitted members - H01J: ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS (spark-gaps H01T; electric arc lamps H05B31/00; particle accelerators H05H) - G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G) - H10P: GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10 - G01N: INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES (measuring or testing apparatus or processes other than immunoassay, involving enzymes or microorganisms C12M, C12Q) - Y10T: TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION ## Abstract A coupling module may include an upper portion that defines an aperture, mask contact elements, chuck contact elements and an intermediate element that is connected between the mask contact elements and the upper portion. A shape and a size of the aperture may correspond to a shape and size of a pattern transfer area of an extreme ultra violet (EUVL) mask. The coupling module may be shaped and sized so that once the mask contact elements contact the upper portion of the EUVL mask, the chuck contact elements contact a chuck that supports the mask. The coupling module may further provide at least one conductive path between the upper portion of the EUVL mask and the chuck when the EUVL mask is positioned on the chuck. ## Claims ### Claim 1 A coupling module for coupling an extreme ultra violet (EUVL) mask to a chuck, the coupling module comprising: an upper portion that defines an aperture; at least one mask contact element; chuck contact elements; and an intermediate element connected between the mask contact elements and the upper portion; wherein a shape and a size of the aperture corresponds to a shape and size of a pattern transfer area of the EUVL mask; wherein the coupling module is shaped and sized so that once the at least one mask contact element contacts an upper portion of the EUVL mask, the chuck contact elements contact a chuck that supports the EUVL mask; and wherein the coupling module provides at least one conductive path between the upper portion of the EUVL mask and the chuck, when the EUVL mask is positioned on the chuck in alignment with the coupling module. ### Claim 2 (depends on 1) The coupling module according to claim 1, wherein when the EUVL mask is positioned on the chuck, the coupling module masks edges of the EUVL mask. ### Claim 3 (depends on 1) The coupling module according to claim 1, wherein at least one mask contact element comprises a spring. ### Claim 4 (depends on 1) The coupling module according to claim 1, wherein a height difference between the upper portion and a bottom end of the intermediate element is smaller than a height of the EUVL mask. ### Claim 5 (depends on 1) The coupling module according to claim 1, wherein the mask contact elements are positioned so as to contact the EUVL mask at locations that are outside the pattern transfer area. ### Claim 6 (depends on 1) The coupling module according to claim 1, wherein the aperture exposes the pattern transfer area once the coupling module is placed on the EUVL mask. ### Claim 7 (depends on 1) The coupling module according to claim 1, wherein the intermediate element is shaped so as to surround the EUVL mask. ### Claim 8 (depends on 1) The coupling module according to claim 1, wherein the intermediate element is shaped so as to contact at least one sidewall of the EUVL mask, when the coupling module is placed on the EUVL mask. ### Claim 9 (depends on 1) The coupling module according to claim 1, wherein the coupling module is symmetrical about a center of the EUVL mask. ### Claim 10 (depends on 1) The coupling module according to claim 1, wherein the coupling module is made of stainless steel. ### Claim 11 (depends on 1) The coupling module according to claim 1, wherein the at least one conductive path is formed by a conductive coating of a non-conductive coupling module. ### Claim 12 (depends on 1) The coupling module according to claim 1, wherein the at least one conductive path comprises multiple conductive paths. ### Claim 13 (depends on 1) The coupling module according to claim 1, wherein at least one mask contact element is arranged to loosely contact the chuck when the coupling module is placed on the EUVL mask. ### Claim 14 (depends on 1) The coupling module according to claim 1, wherein the coupling module comprises multiple coupling module conductive portions that are isolated from each other; wherein different coupling module conductive portions are coupled to different mask contact elements; and wherein each mask contact element electrically couples a coupling module conductive portion to the EUVL mask. ### Claim 15 A method for inspecting an extreme ultra violet (EUVL) mask, the method comprising: placing on a chuck an EUVL mask and a coupling module, wherein the coupling module electrically couples an upper portion of the EUVL mask and the chuck; and scanning at least a portion of a pattern transfer area of the EUVL mask by a charged particle beam that passes through an aperture defined by an upper portion of the coupling module, while the chuck, the coupling module and the charged particle beam are located in a vacuum chamber.