# US 8,772,716 B2 · Phase plate for a TEM > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 8,772,716 B2 - Document ID: US8772716B2 - Status: Granted - Kind: B2 - Application number: 13/896,103 - Filed: 2013-05-16 - Published: 2013-11-28 - Granted: 2014-07-08 - Earliest claimed: 2012-05-23 - Assignees: FEI Company - Applicants: FEI Company - Inventors: Bart Buijsse - Web page: https://patentgrep.com/patent/US8772716B2 ## CPC - H01J 37/263: {Contrast, resolution or power of penetration} - H01J 2237/2614: Holography or phase contrast, phase related imaging in general, e.g. phase plates - H01J 2237/2802: Transmission microscopes - H01J: ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS (spark-gaps H01T; electric arc lamps H05B31/00; particle accelerators H05H) ## Abstract A phase plate, specifically a Zernike type phase plate, for use in an electron microscope comprises a central hole, and a thin film causing a phase shift of the electrons passing through said film. This phase shift causes the Contrast Transfer Function (CTF) to change from a sine-like function to a cosine-like function. The phase plate is equipped with a film in the form of an annulus, carried by a much thinner film. As a result only in a small spatial frequency range (for low frequencies) the phase is changed (and thus the CTF), and for other spatial frequencies the phase shift is negligible, and thus the CTF remains unchanged. Due to the much smaller thickness of the carrier film the scattering of electrons is negligible as well. ## Claims ### Claim 1 A phase plate suitable for an electron microscope, the microscope adapted to generate a beam of electrons, said beam of electrons in working passing through a sample, said beam of electrons in working, after passing through the sample, divided in an undiffracted beam and a diffracted beam, the sample in working imaged in an image plane where the undiffracted and the diffracted beams in working interfere to form an image, the phase plate placed in a plane where the undiffracted and the diffracted beam in working are focused, the phase plate comprising: a central area, said central area in working causing a first phase shift of electrons, a first thin film surrounding and bordering the central area, said first thin film in working causing a second phase shift of electrons differing from the first phase shift, a holder structure surrounding the first thin film suitable for holding the phase plate, the difference between first phase shift and second phase shift in working causing an improvement of the contrast in the image for a range of spatial frequencies, wherein between the first thin film and the holder structure at least one further thin film is present, said further thin film in working causing a further phase shift of electrons differing from the second phase shift, the difference between first phase shift and further phase shift for a further range of spatial frequencies in working causing an improvement of the contrast in the image compared to the situation where the further phase shift would equal the second phase shift the first thin film and the further thin film are formed as concentric annuli, the annulus forming the further thin film surrounding and bordering the annulus forming the first thin film, the centre of the annuli coinciding with the middle of the central area. ### Claim 2 (depends on 1) The phase plate of claim 1 in which the central area is a through-hole, and the first phase shift thus equals zero. ### Claim 3 (depends on 1) The phase plate of claim 1 in which the first thin film in working causes a phase shift such, that the absolute value of the Contrast Transfer Function, ICTFI of the corresponding frequency range is changed from a value of at most 0.5 of the maximum attainable CTF to a value of at least 0.5 of the maximum attainable CTF, more specifically from a value of less than 0.7 of the maximum attainable CTF to a value of at least 0.7 of the maximum attainable CTF. ### Claim 4 (depends on 1) The phase plate of claim 1 in which the further thin film in working causes the further phase shift such, that in said further range of spatial frequencies ICTFI of the corresponding frequency range is changed from a value of at most 0.5 of the maximum attainable CTF to a value of at least 0.5 of the maximum attainable CTF, more specifically from a value of less than 0.7 of the maximum attainable CTF to a value of at least 0.7 of the maximum attainable CTF. ### Claim 5 (depends on 1) The phase plate of claim 1 in which the further thin layer is a graphene layer or a graphene double-layer. ### Claim 6 (depends on 1) The phase plate of claim 1 in which the thickness of at least one of the thin films is modulated as a function of the distance from the center in such a way that in working the resultant absolute value of the ICTFI is for the corresponding frequency range above 0.5 of the maximum attainable CTF, more specifically more than 0.7 of the maximum attainable CTF, most specifically more than 0.9 of the maximum attainable CTF. ### Claim 7 (depends on 6) The phase plate of claim 6 in which the CTF in working does not change sign for the frequency corresponding to the outer edge of the first thin film and the inner edge of the further thin film. ### Claim 8 (depends on 1) The phase plate of claim 1 in which the first thin film and the further film show a difference in thickness, as a result of which in working the phase shift caused by the first thin film and the further thin film differ. ### Claim 9 (depends on 1) The phase plate of claim 1 in which the first thin film and the further thin film show materials with different averaged internal potentials, as a result of which in working the phase shift caused by the first thin film and the further thin film differ. ### Claim 10 (depends on 1) The phase plate of claim 1 in which the further thin film shows openings, the first thin layer connected to the holder structure by spokes dividing the openings. ### Claim 11 (depends on 1) An electron microscope, comprising: a source of electrons; an objective lens for focusing the electrons; the phase plate in accordance with claim 1; an imaging device for forming an image from the electrons.