# US 8,772,121 B2 · Phase change memory devices and methods of manufacturing the same

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- Number: US 8,772,121 B2
- Document ID: US8772121B2
- Status: Granted
- Kind: B2
- Application number: 13/443,132
- Filed: 2012-04-10
- Published: 2012-11-01
- Granted: 2014-07-08
- Earliest claimed: 2011-04-26
- Assignees: Samsung Electronics Co., Ltd.
- Applicants: Kyu-Man Hwang; Jun-Soo Bae; Sung-Un Kwon; Kwang-Ho Park
- Inventors: Kyu-Man Hwang; Jun-Soo Bae; Sung-Un Kwon; Kwang-Ho Park
- Web page: https://patentgrep.com/patent/US8772121B2

## CPC

- H10N 70/231: {based on solid-state phase change, e.g. between amorphous and crystalline phases, Ovshinsky effect}
- H10B 63/20: {comprising selection components having two electrodes, e.g. diodes}
- H10B 63/80: {Arrangements comprising multiple bistable or multi-stable switching components of the same type on a plane parallel to the substrate, e.g. cross-point arrays}
- H10N 70/066: {by filling of openings, e.g. damascene method}
- H10N 70/826: {adapted for essentially vertical current flow, e.g. sandwich or pillar type devices}
- H10N: ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10B: ELECTRONIC MEMORY DEVICES

## Abstract

A method of manufacturing a phase change memory device includes forming a lower electrode layer pattern and an insulating interlayer covering the lower electrode layer pattern, forming a first opening in the insulating interlayer to expose the lower electrode layer pattern, forming an oxide layer pattern on the sidewall of the first opening and a lower electrode under the oxide layer pattern by partially removing the oxide layer and the lower electrode layer pattern, forming an insulation layer filling a remaining portion of the first opening, removing the oxide layer pattern by a wet etching process to form a second opening, and forming a phase change material pattern on the lower electrode such that the phase change material pattern fills the second opening.

## Claims

### Claim 1

A method of manufacturing a phase change memory device, the method comprising:
forming a lower electrode layer pattern on a substrate;
forming an insulating interlayer covering the lower electrode layer pattern on the substrate;
partially removing the insulating interlayer to form a first opening, the first opening exposing the lower electrode layer pattern;
forming an oxide layer on the lower electrode layer pattern and on a sidewall of the first opening;
partially removing the oxide layer and the lower electrode layer pattern to form an oxide layer pattern on the sidewall of the first opening and a lower electrode under the oxide layer pattern;
forming an insulation layer filling a remaining portion of the first opening on the substrate;
removing the oxide layer pattern by a wet etching process to form a second opening, the second opening exposing a top surface of the lower electrode; and
forming a phase change material pattern on the lower electrode such that the phase change material pattern fills the second opening.

### Claim 2 (depends on 1)

The method as claimed in claim 1, wherein the wet etching process is performed using an etching solution that has a higher etching rate for the oxide layer pattern than for the insulating interlayer and the insulation layer.

### Claim 3 (depends on 2)

The method as claimed in claim 2, wherein the etching solution includes a hydrofluoric acid solution or a buffer oxide etchant solution.

### Claim 4 (depends on 1)

The method as claimed in claim 1, wherein the insulating interlayer and the insulation layer are formed using a silicon nitride or a silicon oxynitride.

### Claim 5 (depends on 1)

The method as claimed in claim 1, further comprising forming a plurality of conductive patterns on the substrate such that at least one pair of neighboring conductive patterns are formed on the substrate, the lower electrode layer pattern being formed on portions of the pair of neighboring conductive patterns and on a portion of the substrate between the pair of neighboring conductive patterns.

### Claim 6 (depends on 5)

The method as claimed in claim 5, wherein partially removing the oxide layer and the lower electrode layer pattern exposes the portions of the pair of neighboring conductive patterns and the portion of the substrate between the pair of neighboring conductive patterns.

### Claim 7 (depends on 5)

The method as claimed in claim 5, wherein forming the plurality of conductive patterns includes:
forming a barrier metal layer pattern on the substrate such that the barrier metal layer pattern has a cup shape, and
forming a metal layer pattern on the barrier metal layer pattern such that a sidewall and a bottom surface of the metal layer pattern are surrounded by the barrier metal layer pattern.

### Claim 8 (depends on 7)

The method as claimed in claim 7, wherein the lower electrode is in contact with a top surface of the metal layer pattern.

### Claim 9 (depends on 1)

The method as claimed in claim 1, wherein forming the lower electrode layer pattern includes:
forming a first conductive layer on the substrate, the first conductive layer including a metal nitride or a metal silicon nitride,
forming a second conductive layer on the first conductive layer, the second conductive layer including a metal, and
partially etching the first conductive layer and the second conductive layer.

### Claim 10

A method of manufacturing a phase change memory device, the method comprising:
providing a substrate, the substrate having a pair of adjacent conductive patterns thereon;
forming an insulating interlayer including a first opening, the first opening exposing portions of the pair of adjacent conductive patterns or a lower electrode layer pattern on the substrate that overlaps the portions of the pair of adjacent conductive patterns;
forming oxide layer patterns on a sidewall of the first opening such that each oxide layer pattern overlaps one of the pair of adjacent conductive patterns;
forming an insulation layer on the oxide layer patterns such that the insulation layer fills the first opening;
removing the oxide layer patterns by a wet etching process to form second openings; and
filling the second openings with a phase change material to form phase change material patterns on the substrate.

### Claim 11 (depends on 10)

The method as claimed in claim 10, wherein the insulation layer is formed to abut the oxide layer patterns in the first opening such that the insulation layer and the oxide layer patterns completely fill the first opening.

### Claim 12 (depends on 11)

The method as claimed in claim 11, wherein the first opening is filled with the oxide layer patterns and the insulation layer before the second openings are formed.

### Claim 13 (depends on 10)

The method as claimed in claim 10, wherein, before forming the insulation layer, forming the oxide layer patterns includes:
forming an oxide layer in the first opening, the oxide layer covering a bottom surface of the first opening and the sidewall of the first opening, and
partially removing the oxide layer such that the oxide layer patterns on the sidewall of the first opening remains.

### Claim 14 (depends on 10)

The method as claimed in claim 10, wherein a width of the first opening is greater than a width of the second opening.