# US 8,771,530 B2 · Method for producing polarizing element

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- Number: US 8,771,530 B2
- Document ID: US8771530B2
- Status: Granted
- Kind: B2
- Application number: 13/774,042
- Filed: 2013-02-22
- Published: 2013-09-05
- Granted: 2014-07-08
- Earliest claimed: 2012-03-05
- Assignees: Seiko Epson Corporation
- Applicants: Seiko Epson Corporation
- Inventors: Yoshitomo Kumai
- Web page: https://patentgrep.com/patent/US8771530B2

## CPC

- G02B 1/12: by surface treatment, e.g. by irradiation
- G02B 5/3058: {comprising electrically conductive elements, e.g. wire grids, conductive particles}
- G02B: OPTICAL ELEMENTS, SYSTEMS OR APPARATUS

## Abstract

A method for producing a polarizing element includes: forming particulate materials of a metal halide on a glass substrate; forming a protective film that covers the particulate materials in a non-plasma environment; stretching the particulate materials by heating and stretching the glass substrate; and forming acicular metal particles by reducing the metal halide constituting the stretched particulate materials.

## Claims

### Claim 1

A method tor producing a polarizing element, comprising:
forming particulate materials containing a metal halide on a glass substrate;
forming a protective film that covers the particulate materials in a non-plasma environment;
stretching the particulate materials by stretching the glass substrate at a temperature at which the glass substrate is softened; and
forming acicular metal particles by reducing the metal halide constituting the stretched particulate materials.

### Claim 2 (depends on 1)

The method for producing a polarizing element according to claim 1, wherein the protective film is formed by a vacuum vapor deposition method.

### Claim 3 (depends on 1)

The method for producing a polarizing element according to claim 1, wherein the protective film is formed by a liquid-phase method.

### Claim 4 (depends on 1)

The method for producing a polarizing element according to claim 1, wherein the forming particulate materials includes:
forming a coating film of a metal on the glass substrate; and
forming the particulate materials by subjecting the coating film to an etching treatment in a halogen gas environment.