# US 8,771,529 B1 · Method for imprint lithography

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- Number: US 8,771,529 B1
- Document ID: US8771529B1
- Status: Granted
- Kind: B1
- Application number: 12/894,640
- Filed: 2010-09-30
- Granted: 2014-07-08
- Earliest claimed: 2010-09-30
- Assignees: Seagate Technology LLC
- Applicants: Kim Yang Lee; Bing Yen; David Kuo; Koichi Wago; Shih-Fu Lee; Dieter Weller
- Inventors: Kim Yang Lee; Bing Yen; David Kuo; Koichi Wago; Shih-Fu Lee; Dieter Weller
- Web page: https://patentgrep.com/patent/US8771529B1

## CPC

- B29C 59/022: {characterised by the disposition or the configuration, e.g. dimensions, of the embossments or the shaping tools therefor}
- G03F 7/0002: {Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping}
- B29C: SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING (making preforms B29B11/00; making laminated products by combining previously unconnected layers which become one product whose layers will remain together B32B37/00 - B32B41/00)
- G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G)

## Abstract

A method of imprint lithography includes imprinting a first pattern with a first template on a first substrate of a lithographic template. A second pattern is imprinted with a second template on the substrate of the lithographic template. The first pattern and the second pattern at least partially overlap, thus forming a third pattern. The third pattern is lithographically formed on a second substrate with the lithographic template. In an embodiment, the first pattern is a concentric line pattern formed by thin film deposition. In an embodiment, the second pattern is a radial line pattern. In an embodiment the first pattern and the second pattern may have line frequency increased.

## Claims

### Claim 1

A method comprising:
imprinting a first pattern with a first template on a first substrate of a lithographic template;
imprinting a second pattern with a second template on said first substrate of said lithographic template, wherein:
said first pattern and said second pattern at least partially overlap; and
said first pattern and said second pattern form a third pattern; and
lithographically forming said third pattern on a second substrate with said lithographic template.

### Claim 2 (depends on 1)

The method of claim 1 wherein at least one of said imprinting a first pattern or said imprinting a second pattern comprises imprinting a concentric line pattern.

### Claim 3 (depends on 1)

The method of claim 1 wherein at least one of said imprinting a first pattern or said imprinting a second pattern comprises imprinting a radial line pattern.

### Claim 4 (depends on 1)

The method of claim 1 wherein lithographically forming said third pattern on a second substrate comprises lithographically forming perpendicular magnetic recording islands.

### Claim 5 (depends on 1)

The method of claim 1 further comprising increasing line frequency on at least one of said first template or said second template.

### Claim 6 (depends on 1)

The method of claim 1:
wherein said lithographically forming said third pattern on a second substrate with said lithographic template comprises lithographically forming said third pattern on a first radial zone on said second substrate with said lithographic template, and
further comprising lithographically forming a fourth pattern on a second radial zone on said second substrate.

### Claim 7 (depends on 6)

The method of claim 6 further comprising skewing at least one of said third pattern or said fourth pattern to accommodate head skew effects.

### Claim 8

A method comprising:
increasing line density of a second pattern in comparison to line density of a first pattern;
transferring said second pattern to a perpendicular magnetic recording media template, wherein:
said second pattern at least partially overlaps said first pattern on said perpendicular magnetic recording media template, and
said first pattern and said second pattern form a third pattern on said perpendicular magnetic recording media template; and
imprinting said third pattern on a perpendicular magnetic recording medium with said perpendicular magnetic recording media template.

### Claim 9 (depends on 8)

The method of claim 8 further comprising forming said first pattern on said perpendicular magnetic recording media template with a concentric line pattern template, wherein said concentric line pattern template is formed by a thin film deposition process.

### Claim 10 (depends on 8)

The method of claim 8 wherein said transferring said second pattern comprises transferring said second pattern from a positive oblique radial line template or a negative oblique radial line template.

### Claim 11 (depends on 8)

The method of claim 8:
wherein said imprinting said third pattern on a perpendicular magnetic recording medium with said perpendicular magnetic recording media template, comprises imprinting said third pattern on a first radial zone of said perpendicular magnetic recording medium with said perpendicular magnetic recording media template, and
further comprising imprinting a fourth pattern on a second radial zone of said perpendicular magnetic recording medium.

### Claim 12 (depends on 8)

The method of claim 8 further comprising skewing said third pattern to accommodate head skew effects.

### Claim 13

A method comprising:
depositing alternating layers of a first material and a second material on a mandrel to form concentric rings around said mandrel;
dicing said mandrel and said alternating layers into a slice;
bonding said slice onto a backing plate; and
removing one of said first material or said second material to form a concentric line pattern.

### Claim 14 (depends on 13)

The method of claim 13, further comprising imprinting a perpendicular magnetic recording media template with said concentric line pattern.

### Claim 15 (depends on 13)

The method of claim 13, wherein said depositing alternating layers of a first material and a second material comprises depositing alternating layers of said first material and said second material using thin film deposition.

### Claim 16 (depends on 13)

The method of claim 13, wherein said depositing alternating layers, comprises depositing alternating layers that are each less than or equal to 2 nm in thickness.

### Claim 17 (depends on 13)

The method of claim 13, wherein said removing one of said first material or said second material comprises etching one of said first material or said second material.

### Claim 18 (depends on 13)

The method of claim 13, further comprising dicing said mandrel and said alternating layers into a plurality of slices.

### Claim 19 (depends on 13)

The method of claim 13, further comprising increasing line density of said concentric line pattern.