# US 8,771,483 B2 · Combinatorial process system > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 8,771,483 B2 - Document ID: US8771483B2 - Status: Granted - Kind: B2 - Application number: 12/027,980 - Filed: 2008-02-07 - Published: 2009-03-05 - Granted: 2014-07-08 - Earliest claimed: 2007-09-05 - Assignees: Intermolecular, Inc. - Applicants: Rick Endo; Kurt Weiner; Indranil De; James Tsung; Maosheng Zhao; Jeremy Cheng - Inventors: Rick Endo; Kurt Weiner; Indranil De; James Tsung; Maosheng Zhao; Jeremy Cheng - Web page: https://patentgrep.com/patent/US8771483B2 ## CPC - H10P 14/412: {Deposition of metallic or metal-silicide materials} - B01J 19/0046: {Sequential or parallel reactions, e.g. for the synthesis of polypeptides or polynucleotides; Apparatus and devices for combinatorial chemistry or for making molecular arrays (synthesis methods per se C40B50/00)} - C23C 14/042: {using masks} - C23C 14/50: Substrate holders - C23C 14/548: {Controlling the composition} - C23C 16/45544: {characterized by the apparatus} - H10P 72/00: Handling or holding of wafers, substrates or devices during manufacture or treatment thereof - H10P 72/0462: {characterised by the construction of the processing chambers, e.g. modular processing chambers} - B01J 2219/0043: for direct application of reagents, e.g. through openings in a shutter - B01J 2219/00536: in the shape of disks - B01J 2219/00596: Solid-phase processes - B01J 2219/00659: Two-dimensional arrays - B01J 2219/00745: Inorganic compounds - B01J 2219/00756: Compositions, e.g. coatings, crystals, formulations - H10P: GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10 - B01J: CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS - C23C: COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL (making metal-coated products by extrusion B21C23/22; covering with metal by connecting pre-existing layers to articles, see the relevant places, e.g. B21D39/00, B23K; metallising of glass C03C; metallising mortars, concrete, artificial stone, ceramics or natural stone C04B41/00; enamelling of, or applying a vitreous layer to, metals C23D; treating metal surfaces or coating of metals by electrolysis or electrophoresis C25D; single-crystal film growth C30B; by metallising textiles D06M11/83; decorating textiles by locally metallising D06Q1/04) ## Abstract A combinatorial processing chamber is provided. The combinatorial processing chamber is configured to isolate a radial portion of a rotatable substrate support, which in turn is configured to support a substrate. The chamber includes a plurality of clusters process heads in one embodiment. An insert having a base plate disposed between the substrate support and the process heads defines a confinement region for a deposition process in one embodiment. The base plate has an opening to enable access of the deposition material to the substrate. Through rotation of the substrate and movement of the opening, multiple regions of the substrate are accessible for performing combinatorial processing on a single substrate. ## Claims ### Claim 1 A combinatorial processing chamber, comprising: a plurality of process heads operable to deposit a layer of material onto a substrate, the plurality of process heads clustered around a first axis, the plurality of process heads coupled to a rotatable assembly operable to rotate around a second axis; a rotatable substrate support operable to rotate around a center axis and an off center axis; a base plate located above the rotatable substrate support to allow a substrate to reside on the rotatable substrate support without the base plate contacting the substrate, the base plate having a single fixed opening for exposing a portion of the rotatable substrate support to one or more of the plurality of process heads; and a moveable plate having a fixed aperture exposing a portion of the fixed opening, the moveable plate slidably located within a recess of the base plate. ### Claim 2 (depends on 1) The chamber of claim 1, wherein the base plate is located proximate to the rotatable substrate support such that the aperture defines a region on the substrate to be processed. ### Claim 3 (depends on 1) The chamber of claim 1, wherein the moveable plate includes multiple fixed apertures. ### Claim 4 (depends on 1) The chamber of claim 1, wherein the moveable plate has multiple fixed apertures of different sizes and wherein one of the multiple fixed apertures is exposed in the chamber during processing. ### Claim 5 (depends on 1) The chamber of claim 1 wherein the moveable plate is moveable in a plane defined above the substrate and limited by the fixed opening. ### Claim 6 (depends on 5) The chamber of claim 5 wherein planar movement of the base plate and rotation of the rotatable substrate support provide access to an entire surface of the substrate. ### Claim 7 (depends on 1) The chamber of claim 1 wherein rotation of the rotatable substrate support is at least 180 degrees. ### Claim 8 (depends on 1) The chamber of claim 1 further comprising: a moveable cap for the fixed aperture. ### Claim 9 (depends on 8) The chamber of claim 8, wherein there are at least two fixed apertures and the moveable cap covers one of the at least two fixed apertures while another of the at least two fixed apertures provides access to a portion of the substrate. ### Claim 10 (depends on 8) The chamber of claim 8, wherein the moveable cap is located within a slot on the moveable plate such that a top surface of the moveable plate and a top surface of the moveable cap are substantially flush with the base plate. ### Claim 11 (depends on 1) The chamber of claim 1 wherein the fixed aperture is selected from a group of shapes consisting of round, quadrilateral, or pie shaped. ### Claim 12 (depends on 1) The chamber of claim 1, further comprising: an outer sidewall extending from the base plate to define the chamber and an inner sidewall disposed within the outer sidewall, the inner sidewall having a diameter smaller than that of the rotatable substrate support, the inner sidewall being disposed between the rotatable substrate support and the plurality of process heads head wherein at least one of the inner sidewall or the outer side wall are moveable. ### Claim 13 (depends on 1) The chamber of claim 1, wherein a top surface of the moveable plate is substantially flush with a top surface of the base plate. ### Claim 14 (depends on 1) The chamber of claim 1, further comprising: an isolation plate disposed to isolate the at least one process head from a processing region of the chamber, wherein the plurality of process heads is moveable in a direction orthogonal to a plane of movement of the isolation plate. ### Claim 15 (depends on 14) The chamber of claim 14, further comprising: an extension housing a plurality of targets, the plurality of targets interchangeable with a target on one of the plurality of process heads while the isolation plate isolates the one of the plurality of process heads.