# US 8,771,460 B2 · Retaining ring for chemical mechanical polishing > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 8,771,460 B2 - Document ID: US8771460B2 - Status: Granted - Kind: B2 - Application number: 13/917,250 - Filed: 2013-06-13 - Published: 2013-10-24 - Granted: 2014-07-08 - Earliest claimed: 1998-06-03 - Assignees: Applied Materials, Inc. - Applicants: Applied Materials, Inc. - Inventors: Steven M. Zuniga; Thomas H. Osterheld - Web page: https://patentgrep.com/patent/US8771460B2 ## CPC - B24B 41/06: Work supports, e.g. adjustable steadies (B24B37/27 takes precedence) - B24B 37/30: for single side lapping of plane surfaces - B24B 37/32: Retaining rings - B24B: MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING (grinding of gear teeth B23F, of screw-threads B23G1/36; by electro-erosion B23H; abrasive or related blasting B24C; tools for grinding, buffing or sharpening B24D; polishing compositions C09G1/00; abrasives C09K3/14; electrolytic etching or polishing C25F3/00; grinding arrangements for use on assembled railway tracks E01B31/17); DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS ## Abstract A carrier head for a chemical mechanical polishing apparatus includes a retaining ring having a flexible lower portion and a rigid upper portion. ## Claims ### Claim 1 A retaining ring for a carrier head having a mounting surface for a substrate, comprising: a generally annular first portion having a top surface and a bottom surface configured for contacting a polishing pad during chemical mechanical polishing, wherein the first portion is a plastic first material and wherein the first portion lacks any channel between the top surface and the bottom surface of the first portion; and a generally annular second portion having a lower surface that extends over at least a portion of the first portion and an upper surface configured to be mechanically affixed to and abut a rigid base of a carrier head, wherein the upper surface includes a hole configured to receive a fastener to mechanically affix the retaining ring to the base, wherein the first portion is fixed directly to the second portion without a removable mechanical fastener, and wherein the second portion is a second material which is more rigid than the first material. ### Claim 2 (depends on 1) The retaining ring of claim 1, wherein the first portion has a durometer measurement between about 80 and 95 on the Shore D scale. ### Claim 3 (depends on 1) The retaining ring of claim 1, wherein the first portion is between about 100 and 400 mils thick. ### Claim 4 (depends on 1) The retaining ring of claim 1, wherein the second portion is thicker than the first portion. ### Claim 5 (depends on 1) The retaining ring of claim 1, wherein the plastic first material is selected from the group consisting of polyphenylene sulfide, polyethylene terephthalate, polyetheretherketone, and polybutylene terephthalate. ### Claim 6 (depends on 1) The retaining ring of claim 1, wherein the second material is a metal. ### Claim 7 (depends on 6) The retaining ring of claim 6, wherein the metal is selected from the group consisting of steel, aluminum, and molybdenum. ### Claim 8 (depends on 1) The retaining ring of claim 1, wherein the second material has an elastic modulus about ten to one-hundred times the elastic modulus of the first material. ### Claim 9 (depends on 1) The retaining ring of claim 1, wherein the bottom surface of the first portion is substantially planar. ### Claim 10 (depends on 1) The retaining ring of claim 1, wherein the bottom surface of the first portion has channels for slurry transport. ### Claim 11 (depends on 1) The retaining ring of claim 1, wherein the retaining ring has an inner side wall and an outer side wall, and the inner side wall and outer side wall are substantially vertical from the upper surface of the upper portion to the bottom surface of the lower portion. ### Claim 12 A retaining ring for a carrier head having a mounting surface for a substrate, comprising: a generally annular first portion having a top surface and a bottom surface configured for contacting a polishing pad during chemical mechanical polishing, wherein the first portion is a plastic first material and wherein the first portion lacks any channel between the top surface and the bottom surface of the first portion; and a generally annular second portion having a lower surface that extends over at least a portion of the first portion and an upper surface configured to be mechanically affixed to and abut a rigid base of a carrier head, wherein the first portion is fixed directly to the second portion without a removable mechanical fastener, wherein an inner side wall and an outer side wall of the retaining ring are substantially vertical from the upper surface of the upper portion to the bottom surface of the lower portion, and wherein the second portion is a second material which is more rigid than the first material. ### Claim 13 (depends on 12) The retaining ring of claim 12, wherein the plastic first material is selected from the group consisting of polyphenylene sulfide, polyethylene terephthalate, polyetheretherketone, and polybutylene terephthalate. ### Claim 14 (depends on 12) The retaining ring of claim 12, wherein the second material is a metal. ### Claim 15 (depends on 14) The retaining ring of claim 14, wherein the metal is selected from the group consisting of steel, aluminum, and molybdenum.