# US 8,771,420 B2 · Substrate processing apparatus > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 8,771,420 B2 - Document ID: US8771420B2 - Status: Granted - Kind: B2 - Application number: 12/714,019 - Filed: 2010-02-26 - Published: 2010-10-21 - Granted: 2014-07-08 - Earliest claimed: 2009-04-16 - Assignees: Samsung Display Co., Ltd. - Applicants: Heung-Yeol Na; Ki-Yong Lee; Jin-Wook Seo; Min-Jae Jeong; Jong-Won Hong; Eu-Gene Kang; Seok-Rak Chang; Yun-Mo Chung; Tae-Hoon Yang; Byung-Soo So; Byoung-Keon Park; Dong-Hyun Lee; Kil-Won Lee; Jong-Ryuk Park; Bo-Kyung Choi; Ivan Maidanchuk; Won-Bong Baek; Jae-Wan Jung - Inventors: Heung-Yeol Na; Ki-Yong Lee; Jin-Wook Seo; Min-Jae Jeong; Jong-Won Hong; Eu-Gene Kang; Seok-Rak Chang; Yun-Mo Chung; Tae-Hoon Yang; Byung-Soo So; Byoung-Keon Park; Dong-Hyun Lee; Kil-Won Lee; Jong-Ryuk Park; Bo-Kyung Choi; Ivan Maidanchuk; Won-Bong Baek; Jae-Wan Jung - Web page: https://patentgrep.com/patent/US8771420B2 ## CPC - H10P 72/0434: {mainly by convection} - H10P: GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10 ## Abstract A substrate processing apparatus that forms thin films on a plurality of substrates and thermally processes the substrates, by uniformly heating the substrates. The substrate processing apparatus includes a processing chamber, a boat in which substrates are stacked, an external heater located outside of the processing chamber, a feeder to move the boat into and out of the processing chamber, a lower heater located below the feeder, and a central heater located in the center of the boat. ## Claims ### Claim 1 A substrate processing apparatus, comprising: a processing chamber; a boat to house substrates; an external heater having a shape of a furnace and surrounding at least 3 sides of the processing chamber; a feeder to move the boat in and out of the processing chamber, the feeder comprising a lower heater disposed below the boat; and a central heater located in a center of the boat, wherein the external heater comprises a first heater disposed along a top surface of the processing chamber, the first heater being parallel to the top surface of the processing chamber, and wherein the center of the boat is substantially at a center of a height between a top and a bottom of the boat, the bottom of the boat corresponding to a side of the processing chamber that is not surrounded by the external heater. ### Claim 2 (depends on 1) The substrate processing apparatus according to claim 1, wherein long axes of the substrates and a long axis of the central heater are parallel. ### Claim 3 (depends on 2) The substrate processing apparatus according to claim 2, further comprising a thermal insulator located under the lower heater. ### Claim 4 (depends on 3) The substrate processing apparatus according to claim 3, wherein the thermal insulator comprises insulation plates and holders to support the insulation plates. ### Claim 5 (depends on 1) The substrate processing apparatus according to claim 1, wherein the processing chamber comprises a manifold comprising: an inlet pipe to supply a reaction gas; an outlet pipe through which discharge gas is pumped out of the processing chamber; and a cover disposed on the manifold, to enclose the processing chamber. ### Claim 6 (depends on 5) The substrate processing apparatus according to claim 5, further comprising a gas supply to supply the reaction gas to the inlet pipe. ### Claim 7 (depends on 6) The substrate processing apparatus according to claim 6, further comprising a gas sprayer connected to the inlet pipe and extending along a length of the boat, when the boat is provided in the processing chamber. ### Claim 8 (depends on 5) The substrate processing apparatus according to claim 5, further comprising a shutter located under the manifold, to open and close the processing chamber. ### Claim 9 (depends on 5) The substrate processing apparatus according to claim 5, further comprising a discharge pump connected to the outlet pipe, to pump the discharge gas through the outlet pipe. ### Claim 10 (depends on 5) The substrate processing apparatus according to claim 5, further comprising a first tube disposed between the cover and the boat. ### Claim 11 (depends on 10) The substrate processing apparatus according to claim 10, further comprising a second tube disposed around the feeder and between the feeder and the first tube. ### Claim 12 (depends on 11) The substrate processing apparatus according to claim 11, wherein the second tube comprises a length equal to an overlapped area of the first tube and the feeder. ### Claim 13 (depends on 11) The substrate processing apparatus according to claim 11, wherein the second tube comprises a hole through which the reaction gas passes. ### Claim 14 A substrate processing apparatus, comprising: a processing chamber comprising a manifold and a cover disposed on the manifold; a boat to house substrates; an external heater having a shape of a furnace and surrounding at least 3 sides of the cover; a feeder to move the boat in and out of the processing chamber, the feeder comprising a lower heater; and a boat heater disposed between at least two substrates at a center of the boat, wherein the external heater comprises a first heater disposed along a top surface of the processing chamber, the first heater being parallel to the top surface of the processing chamber, and wherein the center of the boat is substantially at a center of a height between a top and a bottom of the boat, the bottom of the boat corresponding to a side of the processing chamber that is not surrounded by the external heater. ### Claim 15 (depends on 14) The substrate processing apparatus according to claim 14, wherein the manifold comprises: an inlet pipe to supply a reaction gas to the processing chamber; and an outlet pipe through which a discharge gas is pumped out of the processing chamber. ### Claim 16 (depends on 15) The substrate processing apparatus according to claim 15, further comprising: a first tube disposed inside the cover and the manifold, to insulate the processing chamber; a second tube disposed around the feeder and between the feeder and the first tube, the second tube having a hole connected to the inlet pipe; and a sprayer connected to the hole, to feed the reaction gas to the substrates. ### Claim 17 (depends on 16) The substrate processing apparatus according to claim 16, further comprising: a shutter located under the manifold, to open and close the processing chamber; and a thermal insulator located under the lower heater and comprising insulation plates and holders to support the insulation plates. ### Claim 18 (depends on 7) The substrate processing apparatus according to claim 7, wherein a height of the gas sprayer is substantially equal to a height of a first tube located between the boat and a side of the processing chamber.