# US 8,770,958 B2 · Pattern forming method and pattern forming apparatus in which a substrate and a mold are aligned in an in-plane direction

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- Number: US 8,770,958 B2
- Document ID: US8770958B2
- Status: Granted
- Kind: B2
- Application number: 12/842,118
- Filed: 2010-07-23
- Published: 2010-12-16
- Granted: 2014-07-08
- Earliest claimed: 2005-06-08
- Assignees: Canon Kabushiki Kaisha
- Applicants: Nobuhito Suehira; Junichi Seki; Masao Majima; Atsunori Terasaki; Hideki Ina
- Inventors: Nobuhito Suehira; Junichi Seki; Masao Majima; Atsunori Terasaki; Hideki Ina
- Web page: https://patentgrep.com/patent/US8770958B2

## CPC

- G03F 9/7084: {Position of mark on substrate, i.e. position in (x, y, z) of mark, e.g. buried or resist covered mark, mark on rearside, at the substrate edge, in the circuit area, latent image mark, marks in plural levels}
- B82Y 10/00: Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
- B82Y 40/00: Manufacture or treatment of nanostructures
- G03F 7/0002: {Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping}
- G03F 9/7076: {Mark details, e.g. phase grating mark, temporary mark}
- G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G)
- B82Y: SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES

## Abstract

A pattern forming method for forming an imprinted pattern on a coating material disposed on a substrate with a pattern provided to a mold. The method includes preparing a mold provided with a first surface including a pattern area, a second surface located opposite from the first surface, and an alignment mark provided at a position at which the alignment mark is away from the first surface, contacting the pattern area of the mold with the coating material disposed on the substrate, obtaining information about positions of the mold and the substrate by using the alignment mark and a mark provided to the substrate in a state in which the coating material is disposed on the substrate at a portion where the alignment mark and the substrate are opposite to each other, and effecting alignment of the substrate with the mold in an in-plane direction of the pattern area, on the basis of the information in a state in which the pattern area and the coating material contact each other.

## Claims

### Claim 1

An apparatus for imprinting a pattern onto a material applied on a semiconductor workpiece, the apparatus comprising:
a mold holding portion configured to hold a light transmissive mold, the mold including a first surface having a pattern to be imprinted onto the material, a second surface located opposite from the first surface, a third surface, on a stepped portion, disposed at a position inwardly away from the first surface, and such that the third surface is arranged opposite to an area, of the workpiece, subjected to dicing, the third surface having an alignment structure for alignment between the mold and the workpiece, and the third surface being disposed inwardly away from the first surface with a distance such that the alignment structure does not contact the material through the imprinting;
a workpiece support portion configured to support the workpiece;
a detection mechanism including an optical system and configured to detect, via the optical system, a positional deviation between the alignment structure provided at the third surface of the mold and an alignment structure provided at the area, of the workpiece, subjected to dicing, via a space without the material therein, and in a state in which the first surface of the mold is in contact with the material; and
a moving mechanism configured to align the workpiece with the mold based on the positional deviation detected by the detection mechanism.

### Claim 2 (depends on 1)

An apparatus according to claim 1, further comprising a control mechanism configured to control a gap between the workpiece and the mold based on the detected positional deviation.

### Claim 3 (depends on 1)

An apparatus according to claim 1, further comprising a light source, wherein the apparatus is configured to cause the light source to cure the material while the moving mechanism aligns the workpiece with the mold.

### Claim 4 (depends on 1)

An apparatus according to claim 1, wherein the mold holding portion is configured to hold the mold, in which the third surface is disposed closer to the first surface than to the second surface.