# US 8,770,214 B2 · Gas mixture supplying method and apparatus

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- Number: US 8,770,214 B2
- Document ID: US8770214B2
- Status: Granted
- Kind: B2
- Application number: 12/644,745
- Filed: 2009-12-22
- Published: 2010-06-24
- Granted: 2014-07-08
- Earliest claimed: 2008-12-22
- Assignees: Tokyo Electron Limited
- Applicants: Yohei Uchida; Takahiro Yamamoto
- Inventors: Yohei Uchida; Takahiro Yamamoto
- Web page: https://patentgrep.com/patent/US8770214B2

## CPC

- G05D 11/132: {by controlling the flow of the individual components (G05D11/133 takes precedence)}
- Y10T 137/0363: For producing proportionate flow
- Y10T 137/8122: Planar strainer normal to flow path
- Y10T 137/87684: Valve in each inlet
- G05D: SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
- Y10T: TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION

## Abstract

A gas mixture supplying method includes supplying plural kinds of gases through gas supply lines connected to a common pipeline and supplying a gas mixture of the plural kinds of gases from a gas outlet of the common pipeline to a region where the gas mixture is used through a gas mixture supply line. When two or more gases having different flow rates are supplied simultaneously, a gas having a relatively low flow rate is supplied from one of the gas supply lines provided at a position closer to the gas outlet than that for a gas having a relatively high flow rate.

## Claims

### Claim 1

A gas mixture supplying method for supplying a gas mixture to a semiconductor manufacturing apparatus, comprising:
supplying plural kinds of gases through gas supply lines connected to a common pipeline;
supplying the plural kinds of gases from a gas outlet of the common pipeline to a gas mixture supply pipeline, and supplying a gas mixture from the gas mixture supply pipeline to a processing chamber of the semiconductor manufacturing apparatus where the gas mixture is used; and
arranging the gas supply lines, the common pipeline, and the gas mixture supply pipeline so as to reduce a stabilization time of the gas mixture at the processing chamber by:
(a) providing a first gas having a relatively low flow rate which is supplied from a first gas supply line of the gas supply lines at a first position which is closer to the gas outlet than a second position at which a second gas supply line of the gas supply lines supplies a second gas having a relatively high flow rate; and
(b) reducing the gas mixture stabilization time of a gas mixture of the first gas and the second gas compared to an arrangement in which an inner diameter at a portion of the common pipeline upstream from the gas outlet is set to be the same as an inner diameter of the gas mixture supply pipeline by providing the inner diameter at the portion of the common pipeline that is upstream from the gas outlet to be smaller than the inner diameter of the gas mixture supply pipeline,
wherein the gas mixture supply pipeline is disposed between the processing chamber and the common pipeline, and
wherein the common pipeline has a constant inner diameter along an entire length of the common pipeline, the common pipeline extending from the gas supply lines to the gas outlet.

### Claim 2 (depends on 1)

The gas mixture supplying method of claim 1, wherein, among the plural kinds of gases, a gas having a lowest flow rate is supplied from the gas supply line provided at a position closest to the gas outlet, while a gas having a highest flow rate is supplied from the gas supply line provided at a position farthest from the gas outlet.

### Claim 3 (depends on 2)

The gas mixture supplying method of claim 2, wherein a filter is provided in the gas mixture supply pipeline to remove particles from the gas mixture.

### Claim 4 (depends on 2)

The gas mixture supplying method of claim 2, wherein an inner diameter of the common pipeline is ¼ inch, and an inner diameter of the gas mixture supply pipeline is ½ inch.

### Claim 5 (depends on 1)

The gas mixture supplying method of claim 1, wherein a filter is provided in the gas mixture supply pipeline to remove particles from the gas mixture.

### Claim 6 (depends on 1)

The gas mixture supplying method of claim 1, wherein an inner diameter of the common pipeline is ¼ inch, and an inner diameter of the gas mixture supply pipeline is ½ inch.

### Claim 7 (depends on 1)

The gas mixture supplying method of claim 1, further including providing a valve along the gas mixture supply pipeline.