Coating and developing apparatus, coating and developing method, and storage medium

A coating and developing apparatus for forming a resist pattern a plurality of times in succession on a substrate, comprising:

• a carrier block into/from which a carrier housing a plurality of substrates is carried;
• a treatment block treating a substrate taken out of said carrier, said treatment block comprising a water repellent module performing water repellent treatment on a substrate, a coating module applying a resist to a substrate, a developing module performing development by supplying a developing solution to a substrate which has been subjected to liquid-immersion exposure, and a substrate carrier device carrying a substrate between said modules;
• an interface block delivering a substrate between said treatment block and an external aligner performing liquid-immersion exposure on the resist;
• a substrate side-surface portion water repellent module for performing water repellent treatment on a side surface of a substrate;
• and
• a control unit controlling operations of said substrate carrier device and said modules to execute steps of performing water repellent treatment at least on a side surface portion of a substrate in said water repellent module and performing a first resist coating on an entire surface of the substrate in said coating module, performing a first development in said developing module after a first liquid-immersion exposure is performed in said aligner, then performing a second resist coating on the entire surface in said coating module, and performing a second development in said developing module after a second liquid-immersion exposure is performed in said aligner, and further to execute a step of performing water repellent treatment on the side surface portion of the substrate after the first development and before the second exposure is performed.