Semiconductor single crystal production device and producing method therefor
AssigneeSumco Techxiv Corporation
InventorsAkiko Noda, Tetsuhiro IIda
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AssigneeSumco Techxiv Corporation
InventorsAkiko Noda, Tetsuhiro IIda
Estimating the term…
Evaporated matters and reaction products produced in a furnace can be exhausted without contacting with a graphite crucible and a heater, and an exhaust pipe per se can be maintained at a high temperature to suppress the deposition and condensation of the evaporated matters and reaction products, whereby the clogging of the exhaust pipe is prevented, in addition, a conversion of the exhaust pipes per se into SiC is suppressed to improve the durability of the exhaust pipe, and the change in thermal expansion coefficient is suppressed, whereby a thermal single crystal can be pulled up in high quality. Further, the exhaust pipe is formed of a small number of materials to reduce a production cost. A heat shield (12) made of a heat insulating material is provided outside a heater (6), and a plurality of exhaust pipes (20) are provided between the heater (6) and the heat shield (12). The plurality of exhaust pipes (20) are communicated with a plurality of exhaust ports (8B (22b)) provided at a bottom of a chamber 1.
A semiconductor single crystal production device including a chamber in which a crucible for melting a raw material of a semiconductor single crystal, a round-cylindrical heater that is provided around the crucible and that heats the raw-material in the crucible and round-cylindrical heat insulating cylinder that is provided outside the round-cylindrical heater so as to surround the periphery of the heater and that insulate a radiant heat are disposed, the semiconductor single crystal production device having a pulling-up mechanism for immersing a seed crystal into the melted raw material and pulling up a single crystal, characterized in that:
Dependencies are inferred from the claim text.