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US 8,748,845 B2Granted
Ion sources, systems and methods
AssigneeCarl Zeiss Microscopy GmbH
InventorsBilly W. Ward, John A. Notte, Louis S. Farkas, Randall G. Percival, Raymond Hill, Klaus Edinger, Lars Markwort, Dirk Aderhold, Ulrich Mantz
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Abstract
Ion sources, systems and methods are disclosed.
Claims28
A method, comprising:
- generating a first ion beam using a focused ion beam source;
- generating second ion beam by interacting a gas with a gas field ion source, the second ion beam being different from the first ion beam;
- generating an electron beam using a system different from the gas field ion source;
- and
- using the first ion beam, the second ion beam and the electron beam to interact with a sample.
2 more elements
A system, comprising:
- a focused ion beam instrument capable of generating a first ion beam;
- a scanning electron microscope capable of providing an electron beam;
- and
- a gas field ion source capable of interacting with a gas to generate a second ion beam which is different from the first ion beam,
- wherein the focused ion beam instrument, the scanning electron microscope and the gas field ion source are positioned so that, during use, the focused ion beam instrument, the electron beam and the ion beam can be used to interact with a sample.
2 more elements
Dependencies are inferred from the claim text.