Methods and apparatus for treating exhaust gas in a processing system
AssigneeApplied Materials, Inc.
InventorsColin John Dickinson, Mehran Moalem, Daniel O. Clark
Life of this patent
Estimating the term…
Abstract
Methods and apparatus for treating an exhaust gas in a foreline of a substrate processing system are provided herein. In some embodiments, an apparatus for treating an exhaust gas in a foreline of a substrate processing system includes a plasma source coupled to a foreline of a process chamber, a reagent source coupled to the foreline upstream of the plasma source, and a foreline gas injection kit coupled to the foreline to controllably deliver a gas to the foreline, wherein the foreline injection kit includes a pressure regulator to set a foreline gas delivery pressure setpoint, and a first pressure gauge coupled to monitor a delivery pressure of the gas upstream of the foreline.
Claims14
An apparatus for treating an exhaust gas in an exhaust conduit of a substrate processing system, comprising:
- a plasma source coupled to an exhaust conduit of a process chamber;
- a reagent source coupled to the exhaust conduit upstream of the plasma source;
- and
- a gas injection kit coupled to the exhaust conduit to controllably deliver a gas to the exhaust conduit to control an exhaust conduit pressure, wherein the gas injection kit includes:
- a pressure regulator to set a gas delivery pressure setpoint;
- and
- a first pressure gauge to monitor a delivery pressure of the gas wherein the gas injection kit is coupled to the exhaust conduit downstream of the plasma source.
An apparatus for treating an exhaust gas from a substrate processing system, comprising:
- a reagent source located downstream of a processing chamber to provide a reagent to a flow of the exhaust gas;
- a plasma source located downstream of the reagent source to form a plasma from the reagent and the exhaust gas;
- and
- a gas injection kit to controllably deliver a gas to control an exhaust gas pressure, wherein the gas injection kit includes:
- a pressure regulator to set a gas delivery pressure setpoint;
- and
- a first pressure gauge to monitor a delivery pressure of the gas wherein the gas injection kit is coupled to the exhaust conduit downstream of the plasma source.
Dependencies are inferred from the claim text.