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US 8,741,062 B2Granted
Apparatus and methods for deposition reactors
AssigneePicosun Oy
InventorsSven Lindfors, Pekka J. Soininen
Life of this patent
Estimating the term…
Abstract
An apparatus, such as an ALD (Atomic Layer Deposition) apparatus, including a precursor source configured for depositing material on a heated substrate in a deposition reactor by sequential self-saturating surface reactions. The apparatus includes an in-feed line for feeding precursor vapor from the precursor source to a reaction chamber and a structure configured for utilizing heat from a reaction chamber heater for preventing condensation of precursor vapor into liquid or solid phase between the precursor source and the reaction chamber. Also various other apparatus and methods are presented.
Claims19
An apparatus comprising:
- a deposition reactor comprising a vacuum chamber enclosing a sealable reaction chamber;
- a reaction chamber heater placed in the vacuum chamber;
- a precursor source configured for depositing material on a heated substrate in the deposition reactor by sequential self-saturating surface reactions;
- an in-feed line for feeding precursor vapor from the precursor source through the vacuum chamber to the sealable reaction chamber, the in-feed line going through a vacuum chamber wall of the reactor;
- and
- a structure configured to utilize heat from the reaction chamber heater for preventing condensation of precursor vapor into liquid or solid phase between the precursor source and the sealable reaction chamber, said structure comprising:
- a protruding internal neck arranged around said in-feed line, and said protruding internal neck protruding through said vacuum chamber wall;
- and
- an outer neck around the protrusion, the internal neck and the outer neck forming a gap there between.
6 more elements
An apparatus comprising:
- a deposition reactor comprising a vacuum chamber enclosing a sealable reaction chamber;
- a precursor source configured to deposit material on a heated substrate in the deposition reactor by sequential self-saturating surface reactions;
- two pulsing valves embedded into the precursor source and configured to control feeding of precursor vapor through an in-feed line from the precursor source through the vacuum chamber to the sealable reaction chamber;
- and
- a bypass line between the pulsing valves for feeding inactive gas from a pulsing valve to another pulsing valve, wherein the pulsing valves are further configured to control feeding of the inactive gas from a pulsing valve to another pulsing valve.
2 more elements
An apparatus comprising:
- a deposition reactor comprising a vacuum chamber enclosing a sealable reaction chamber;
- a precursor source configured to deposit material on a heated substrate in the deposition reactor by sequential self-saturating surface reactions;
- a pulsing valve embedded into the precursor source configured to control feeding of precursor vapor through an in-feed line from the precursor source through the vacuum chamber to the sealable reaction chamber, the apparatus being configured to:
- convey inactive gas via the pulsing valve to the precursor source cartridge to raise the pressure inside the precursor source cartridge and to ease subsequent flow of a mixture of precursor vapor and inactive gas towards the reaction chamber.
1 more element
An apparatus comprising:
- a deposition reactor comprising a vacuum chamber enclosing a sealable reaction chamber;
- a reaction chamber heater placed in the vacuum chamber;
- a precursor source configured for depositing material on a heated substrate in the deposition reactor by sequential self-saturating surface reactions;
- an in-feed line for feeding precursor vapor from the precursor source through the vacuum chamber to the sealable reaction chamber;
- a protrusion attached to a wall of the vacuum chamber and coupled to the precursor source, through which the in-feed line passes and extends through the vacuum chamber wall into the reactor, the protrusion comprises an internal neck configured to utilize heat from the reaction chamber heater for preventing condensation of precursor vapor into liquid or solid phase between the precursor source and the sealable reaction chamber, the internal neck is arranged around the in-feed line substantially extending from the precursor source and protruding through the vacuum chamber wall;
- and
- an outer neck arranged around the protrusion, wherein the internal neck and outer neck form a gap there between.
4 more elements
Dependencies are inferred from the claim text.