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US 8,723,138 B2Granted
Electron beam source and method of manufacturing the same
AssigneeCarl Zeiss Microscopy GmbH
InventorsVolker Drexel, Ulrich Mantz, Bernd Irmer, Christian Penzkofer
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Abstract
A tip of an electron beam source includes a core carrying a coating. The coating is formed from a material having a greater electrical conductivity than a material forming the surface of the core.
Claims41
A method, comprising:
- forming a core of a first material on a base using at least one deposition process selected from the group consisting of electron beam induced deposition and ion beam induced deposition;
- applying a coating of a second material on the core to provide a tip comprising the core and the coating;
- and
- arranging the core opposite to an opening of an extraction electrode, thereby forming an electron beam source,
- wherein at least one of the following conditions is fulfilled:
- an electrical conductivity of the first material is less than 105 S/m;
- an electrical conductivity of the second material is greater than 10−7 S/m;
- and
- a ratio of the electrical conductivity of the second material to the electrical conductivity of the first material is greater than 10:1.
6 more elements
A method, comprising:
- forming a core of a first material on a base using at least one deposition process selected from the group consisting of electron beam induced deposition and ion beam induced deposition;
- applying a coating of a second material on the core to provide a tip comprising the core and the coating;
- and
- arranging the core opposite to an opening of an extraction electrode, thereby forming an electron beam source,
- wherein the core of the tip includes an inner core comprising a third material different from the first material, and a layer comprising the first material is applied onto the inner core.
2 more elements
A method, comprising:
- forming a core of a first material on a base using at least one deposition process selected from the group consisting of electron beam induced deposition and ion beam induced deposition;
- applying a coating of a second material on the core to provide a tip comprising the core and the coating;
- and
- arranging the core opposite to an opening of an extraction electrode, thereby forming an electron beam source,
- wherein the first material comprises sp3-bound carbon.
2 more elements
A method, comprising:
- forming a core of a first material on a base using at least one deposition process selected from the group consisting of electron beam induced deposition and ion beam induced deposition;
- applying a coating of a second material on the core to provide a tip comprising the core and the coating;
- and
- arranging the core opposite to an opening of an extraction electrode, thereby forming an electron beam source,
- wherein at least one of the following conditions is satisfied:
- a surface of the base includes a convex surface portion extending around an end of the tip close to the base;
- and
- the base has a surface portion having a surface shape of axial symmetry relative to an axis of symmetry, and an angle between the axis of symmetry and a longitudinal direction of the tip is less than 10°.
5 more elements
Dependencies are inferred from the claim text.