Formation of an optical waveguide
AssigneeEmpire Technology Development LLC
InventorKeith Goossen
Life of this patent
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Abstract
Technologies are generally described for an optical waveguide, methods and systems effective to form an optical waveguide, and an optical system including an optical waveguide. In some examples, the optical waveguide may include a silicon oxynitride region in a wall of the silicon substrate. The silicon oxynitride region may define an inner region of the optical waveguide. The wall may define a via. The optical waveguide may include a silicon oxide region in the substrate. The silicon oxide region may define an outer region of the optical waveguide adjacent to the inner region.
Claims20
An optical waveguide formed in a silicon substrate, the optical waveguide comprising:
- a silicon oxynitride region in a wall of the silicon substrate, wherein the silicon oxynitride region defines an inner region of the optical waveguide and wherein the wall defines a via;
- and
- a silicon oxide region in the substrate, wherein the silicon oxide region defines an outer region of the optical waveguide adjacent to the inner region.
A method of forming an optical waveguide in a silicon substrate, the method comprising:
- forming a silicon oxynitride region in a wall of the silicon substrate, wherein the silicon oxynitride region defines an inner region of the optical waveguide, and wherein the wall defines a via;
- and
- forming a silicon oxide region in the silicon substrate, wherein the silicon oxide region defines an outer region of the optical waveguide adjacent to the inner region.
An optical communication system including an optical waveguide formed in a silicon substrate, the optical communication system comprising:
- an optical signal transmitter;
- and
- an optical signal receiver, wherein the optical signal receiver is configured to be in communication with the optical signal transmitter through the optical waveguide;
- and
- wherein the optical waveguide includes:
- a silicon oxynitride region in a wall of the silicon substrate, wherein the silicon oxynitride region defines an inner region of the optical waveguide and wherein the wall defines a via;
- and
- a silicon oxide region in the silicon substrate, wherein the silicon oxide region defines an outer region of the optical waveguide adjacent to the inner region.
A system effective to form an optical waveguide in a silicon wafer, wherein the wafer includes a wall that defines a via, the system comprising:
- a reaction chamber;
- a first source of a first gas, wherein the first gas includes nitrogen, and wherein the first source is configured to be in communication with the reaction chamber;
- a second source of a second gas, wherein the second gas includes oxygen, and wherein the second source is configured to be in communication with the reaction chamber;
- a heat source, wherein the heat source is operatively associated with the reaction chamber;
- a processor, wherein the processor is configured to be in communication with the reaction chamber, the first source, the second source, and the heat source, and wherein the processor is configured to operate the first source, second source, and the heat source so as to
- form a silicon oxynitride region in the wall of the silicon substrate, wherein the silicon oxynitride region defines an inner region of the optical waveguide;
- and
- form a silicon oxide region in the substrate, wherein the silicon oxide region defines an outer region of the optical waveguide adjacent to the inner region.
Dependencies are inferred from the claim text.