Electron beam manipulation system and method in X-ray sources
AssigneeGeneral Electric Company
InventorAntonio Caiafa
Life of this patent
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Abstract
The embodiments disclosed herein relate to the controlled generation of X-rays and, more specifically, to the control of electron beams that are used to produce X-rays using one or more electron beam manipulation coils. For example, methods and devices for driving an electron beam manipulation coil, as well as systems using these devices, are provided. The systems are generally configured to maintain a first current though an electron beam manipulation coil using a first voltage source and to switch the first current to a second current using a second voltage source.
Claims25
A controller, comprising:
- a control circuit, comprising:
- an interface adapted to receive an electron beam manipulation coil of an X-ray generation system;
- a first switching device coupled to a first voltage source and configured to create a first current path with the first voltage source toward the electron beam manipulation coil;
- a second switching device coupled to a second voltage source and configured to create a second current path with the second voltage source toward the electron beam manipulation coil;
- and
- a third switching device coupled to a first side of the interface and configured to allow conductance via the first current path and the second current path to the interface when the third switching device is in a closed position, wherein the second and third switching devices are configured to create a third current path with the second voltage source when in respective open positions, the third current path having an opposite polarity with respect to the second current path.
An X-ray system, comprising:
- an X-ray source comprising a cathode assembly configured to emit an electron beam and an anode assembly configured to receive the electron beam, wherein the anode is adapted to generate X-rays in response to the received electron beam and the cathode assembly and anode assembly are disposed within an enclosure;
- a plurality of electromagnetic coils disposed about the enclosure and configured to manipulate the electron beam by varying a dipole or quadrupole magnetic field generated by the plurality of coils;
- and
- a plurality of control circuits coupled to the plurality of electromagnetic coils, wherein each control circuit is coupled to one of the plurality of electromagnetic coils to independently control each coil, and each control circuit comprises:
- a first voltage source;
- and
- a second voltage source, wherein the control circuit is configured such that the first voltage source is used to maintain a current through each coil within a desired range to maintain the dipole or quadrupole magnetic field, and the second voltage source is used to increase or decrease the current through the coil to change the dipole or quadrupole magnetic field.
A method of driving an electron beam manipulation coil, comprising the steps of:
- closing a first switching device to cause a first current at a first polarity to flow along a first current path from a first voltage source toward the electron beam manipulation coil;
- closing a second switching device to allow the first current to flow to the electron beam manipulation coil;
- opening the first switching device after closing the first and second switching devices to stop the flow of the first current to the electron beam manipulation coil and to form a current dissipation loop configured to reduce a magnitude of a current through the electron beam manipulation coil;
- and
- opening the second switching device and a third switching device to cause a second current at a second polarity to flow along a second current path from a second voltage source to the electron beam manipulation coil.
Dependencies are inferred from the claim text.