Lithographic apparatus and device manufacturing method
AssigneeASML Netherlands B.V.
InventorsTimotheus Franciscus Sengers, Sjoerd Nicolaas Lambertus Donders, Hans Jansen, Arjen Boogaard
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Abstract
In a lithographic projection apparatus, a liquid supply system maintains liquid in a space between a projection system of the lithographic projection apparatus and a substrate. A sensor positioned on a substrate table, which holds the substrate, is configured to be exposed to radiation when immersed in liquid (e.g., under the same conditions as the substrate will be exposed to radiation). By having a surface of an absorption element of the sensor, that is to be in contact with liquid, formed of no more than one metal type, long life of the sensor may be obtained.
Claims20
A lithographic projection apparatus arranged to project, using a projection system, a pattern from a patterning device onto a substrate, comprising:
- a movable table;
- a liquid supply system configured to provide a liquid to a space between the projection system and a surface facing the projection system;
- and
- a sensor in or on the table, the sensor configured to be exposed to electromagnetic radiation, the sensor located or locatable under the projection system and the sensor comprising a detector having a sensor surface above which the liquid from the liquid supply system is to be provided, and an isolation material through which the electromagnetic radiation passes, spaced apart from the sensor surface, to be in contact with the liquid and to isolate all or part of the sensor surface from the liquid.
A device manufacturing method, comprising:
- projecting a patterned beam of radiation onto a substrate through a liquid in a space between a projection system of a lithographic apparatus and a substrate;
- and
- providing a liquid between the projection system and a sensor located underneath the projection system and in or on a movable table, the sensor configured to sense electromagnetic radiation and including a detector, and the table comprising a substantially opaque surface comprising an aperture through which the electromagnetic radiation passes to a surface of the detector below the aperture and an isolation material to be in contact with the liquid and to isolate all or part of the detector surface from the liquid, wherein the isolation material is liquid impermeable and covers the aperture.
A sensor configured to be exposed to electromagnetic radiation having a detector comprising a sensor surface that is not to be in contact with liquid, in a lithographic projection apparatus, from a liquid supply system, the sensor comprising an isolation material and a layer of metal having an aperture through which the electromagnetic radiation passes to the sensor surface of the detector below the aperture, a surface of the layer of metal in contact with the isolation material, the isolation material to be in contact with the liquid and to isolate all or part of the surface of the layer of metal and the sensor surface from the liquid, wherein the isolation material is liquid impermeable.
Dependencies are inferred from the claim text.