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US 8,710,849 B2Granted
Particle measurement process and apparatus
AssigneePegasor Oy
InventorJuha Tikkanen
Life of this patent
Estimating the term…
Abstract
A process for measuring particle concentrations in a gas using an ejector for producing an essentially constant sample flow and for efficient mixing of the particle-containing sample and essentially clean, ionized gas. The invention also relates to an apparatus implementing such process. The process and the apparatus can be utilized for example in measuring particle concentrations in an exhaust system of a combustion engine.
Claims24
A process that is used for monitoring the concentration of particles in a particle-containing gas, and includes the steps of:
- providing a main flow of essentially particle-free gas;
- ionizing the main flow;
- using the main flow to educt a sample flow from the particle-containing gas;
- mixing an essential part of the sample flow with an essential part of the main flow and thereby charging at least a fraction of the particles that were in the sample flow;
- measuring an electrical charge that is carried by charged particles that are escaping from the system;
- and
- using the measured charge of the particles that are escaping from the system to estimate the concentration of particles in the original particle-containing gas.
4 more elements
An apparatus for monitoring particles in a duct or channel, comprising:
- a. means for ionizing essentially particle-free gas;
- b. at least one eductor that draws a sample flow from a particle-laden gas in the duct or channel;
- c. means for feeding essentially particle-free, ionized gas to the main flow channel of the eductor;
- d. means for mixing the essentially particle-free, ionized gas and the sample flow from the particle-laden gas;
- and
- e. means for measuring the charge of particles that are escaping from the system and using that measurement to estimate the concentration of particles in the duct or channel.
3 more elements
Dependencies are inferred from the claim text.