Method of manufacturing semiconductor device and semiconductor device

A method of manufacturing a semiconductor device, comprising the steps of:

• (a) providing a semiconductor wafer of a first thickness having a first main surface, a plurality of chip regions provided over the first main surface, a cutting region provided between two of the chip regions adjacent to each other, and a second main surface on the side opposite to the first main surface;
• (b) grinding the second main surface of the semiconductor wafer with a grinding material to reduce the thickness of the semiconductor wafer into a second thickness while leaving a plurality of grinding grooves on the second main surface;
• (c) dicing the semiconductor wafer along the cutting region while leaving the grinding grooves on the second main surface of the semiconductor wafer to obtain semiconductor chips;
• (d) providing a mother substrate made of a metal and having a plurality of chip mounting regions having a first electrode plate and a second electrode plate placed apart from the first electrode plate;
• (e) placing the semiconductor chip over the upper surface of the first electrode plate via a conductive resin paste to face the back surface of the semiconductor chip and the upper surface of the first electrode plate each other while leaving the grinding grooves on the back surface of the semiconductor chip;
• (f) after the step (e), electrically coupling a bonding pad of the semiconductor chip to the second electrode plate via a conductive member;
• (g) after the step (f), sealing, with a resin, the semiconductor chip, the conductive member, a portion of the first electrode plate, a portion of the second electrode plate, and an upper surface of the mother substrate to form a resin molding;
• and
• (h) after the step (g), peeling the mother substrate from the resin molding and exposing the lower surface of the first electrode plate and the lower surface of the second electrode plate from the resin molding.