Semiconductor device having a triple gate transistor and method for manufacturing the same
AssigneeSamsung Electronics Co., Ltd.
InventorsShigenobu Maeda, Jeong Hwan Yang, Junga Choi
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AssigneeSamsung Electronics Co., Ltd.
InventorsShigenobu Maeda, Jeong Hwan Yang, Junga Choi
Estimating the term…
In a semiconductor capable of reducing NBTI and a method for manufacturing the same, a multi-gate transistor includes an active region, gate dielectric, channels in the active region, and gate electrodes, and is formed on a semiconductor wafer. The active region has a top and side surfaces, and is oriented in a first direction. The gate dielectric is formed on the top and side surfaces of the active region. The channels are formed in the top and side surfaces of the active region. The gate electrodes are formed on the gate dielectric corresponding to the channels and aligned perpendicular to the active region such that current flows in the first direction. In one aspect of the invention, an SOI layer having a second orientation indicator in a second direction is formed on a supporting substrate having a first orientation indicator in a first direction.
A semiconductor device comprising:
Dependencies are inferred from the claim text.