Extreme ultraviolet light source device and method for generating extreme ultraviolet light

An extreme ultraviolet light (EUV) source device for generating EUV light, comprising:

• a chamber;
• a target material supply configured to supply a target material to the chamber;
• a first laser configured to irradiate the target material in the chamber with a first laser beam;
• a second laser configured to irradiate the target material, which moves after the irradiation with the first laser beam, with a second laser beam to turn the target material into plasma from which the EUV light is emitted;
• a magnetic field generator configured to generate a magnetic field in the chamber to trap a target material left in the chamber after the plasma is generated;
• a first collecting device configured to collect the trapped target material;
• and
• a first heater configured to heat the trapped target material deposited on the first collecting device.