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AssigneeGigaphoton Inc.
InventorsTakanobu Ishihara, Youichi Sasaki, Kouji Kakizaki, Masahiro Inoue, Takayuki Yabu, Hideo Hoshino
Estimating the term…
A target output device may include: a main body for storing a target material; a nozzle unit, connected to the main body, for outputting the target material as a target; an electrode unit provided so as to face the nozzle unit; a voltage control unit that applies predetermined voltage between the electrode unit and the target material to generate electrostatic force therebetween for pulling out the target material through the nozzle unit; a pressure control unit that applies predetermined pressure to the target material; and an output control unit that causes the target to be outputted through the nozzle unit by controlling signal output timing of each of a first timing signal and a second timing signal, the first timing signal causing the voltage control unit to apply the predetermined voltage between the target material and the electrode unit at first timing, and the second timing signal causing the pressure control unit to apply the predetermined pressure to the target material at second timing.
A target output device for providing a target material to an extreme ultraviolet light source device, the target output device comprising:
An extreme ultraviolet light source apparatus for generating extreme ultraviolet light by irradiating a target material with a laser beam, the extreme ultraviolet light source apparatus comprising:
Dependencies are inferred from the claim text.
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From the US filing history. Foreign family members aren’t listed.
Supply of the plasma generating material: constructional details of the ejection system
Supply of the plasma generating material: arrangements for controlling the supply; Arrangements for measurements
X-ray technique
About 3 years 7 months of term left · ends 26 May 2030 (estimated)
1. Technical Field
This disclosure relates to a target output device and an extreme ultraviolet light source apparatus.
2. Related Art
FIG. 1 illustrates the configuration of an EUV light source apparatus according a first embodiment.
FIG. 2 illustrates a target output unit in enlargement.
FIG. 3 illustrates a nozzle unit in enlargement.
Hereinafter, selected embodiments of this disclosure will be described in detail with reference to the drawings. In the embodiments, a droplet target (hereinafter, a droplet) will be generated using electrostatic force and pressure, as will be described below. In the embodiments, with the synergy effect of the pressure applied to a target material and the attractive force caused by the electrostatic force (hereinafter, electrostatic attraction), a smaller droplet which may move faster can be generated.
A first embodiment will be described with reference to FIG. 1 through FIG. 5. FIG. 1 illustrates the general configuration of an EUV light source apparatus 1. The EUV light source apparatus 1 may comprise, for example, a chamber 100 and a driver laser source 110. The chamber 100 may further comprise a target supply unit 1000, an EUV collector mirror 130, an exhaust pump 140, partition walls 150 and 151, a gate valve 160, and an EUV light source controller 300. The target supply unit 1000 as the “target output device” may be configured of a target output unit 120, a droplet controller 310, a pulse control unit 320, and a pressure control unit 330. Each of the above constituent elements 1, 100, 110, 120, 130, 140, 150, 151, 160, 300, 310, 320, 330, and 1000 may be provided singly, and referenced herein in the singular form. A droplet 201 may be referenced in the plural form in some cases. Accordingly, in the embodiments, it may be written as droplet (s) in some cases.
The chamber 100 may be configured by connecting a first chamber 101, which is larger in volume, and a second chamber 102, which is smaller in volume. The first chamber 101 is a main chamber in which plasma generation and the like may be carried out. The second chamber 102 is a connecting chamber through which EUV light emitted from plasma may be supplied to an exposure apparatus (not shown).