Multi charged particle beam writing apparatus and multi charged particle beam writing method

A multi charged particle beam writing apparatus, comprising:

• a stage on which a target object is placed and which is continuously movable;
• an emitting unit configured to emit charged particle beam;
• an aperture member, in which a plurality of openings are formed, configured to receive irradiation of the charged particle beam on a region including all the plurality of openings, and to form multi-beams by making portions of the charged particle beam pass through the plurality of openings;
• a plurality of blankers configured to perform blanking-deflect regarding beams corresponding to the multi-beams passing through the plurality of openings of the aperture member, respectively;
• a blanking aperture member configured to shield each of the beams deflected by the plurality of blankers so that the beams deflected by the plurality of blankers are beam-off;
• a deflector configured to deflect beams together, which have passed through the blanking aperture member, at each irradiation position of each beam on the target object;
• a writing processing control unit configured to control writing processing with a plurality of beams having passed through different openings among the plurality of openings being irradiated on the target object at a predetermined control grid interval;
• and
• a dose controlling unit configured to variably control each dose of the plurality of beams associated with a deviation of an interval between the plurality of beams irradiated, from the control grid interval according to a deviation amount of the interval between the plurality of beams irradiated when the interval between the plurality of beams irradiated is deviated from the control grid interval.