UV exposure method for reducing residue in de-taping process
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsYu-Hsiang Hu, Chen-Fa Lu, Chung-Shi Liu
Life of this patent
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Abstract
A method of forming an integrated circuit includes providing a wafer, and a tape adhered to the wafer, wherein the tape has a main surface perpendicular to a first direction. The tape is exposed to a light to cause the tape to lose adhesion. In the step of exposing the tape, the wafer and the tape are rotated, and/or the light is tilt projected onto the tape, wherein a main projecting direction of the light and the first direction form a tilt angle greater than zero degrees and less than 90 degrees.
Claims16
A method comprising:
- providing a wafer, and a tape adhered to the wafer, wherein the tape comprises a main surface perpendicular to a first direction;
- and
- exposing the tape to a light to cause the tape to lose adhesion, wherein the step of exposing the tape comprises tilt projecting the light onto the tape with a main projecting direction of the light and the first direction forming a tilt angle greater than zero degrees and less than about 45 degrees.
A method comprising:
- mounting a wafer onto a stage, wherein a ultra-violet (UV) tape is adhered to the wafer;
- rotating the wafer and the tape around an axis;
- and
- exposing the UV tape to a UV light when the wafer and the tape are rotated, wherein a main projecting direction of the UV light and the axis form a tilt angle greater than zero degrees and less than about 45 degrees.
An apparatus for exposing a ultra-violet (UV) tape adhered onto a wafer, the apparatus comprising:
- a stage configured to have the wafer mounted thereon, wherein the stage comprises a main surface perpendicular to a first direction;
- a transfer arm connected to the stage, wherein the transfer arm is configured to rotate the stage;
- a movement guide, with the transfer arm configured to move along the movement guide, and to move from one side of the movement guide to reach an opposite side, wherein the transfer arm is further configured to rotate the stage when the transfer arm moves along the movement guide;
- and
- a UV lamp configured to emit a UV light in a main UV light direction, wherein the apparatus is configured to rotate the stage, or the main UV light direction and the first direction form a tilt angle greater than zero degrees and smaller than 90 degrees.
Dependencies are inferred from the claim text.