Ion beam system and method of operating ion beam system
AssigneeCarl Zeiss Microscopy GmbH
InventorsJosef Biberger, Ralph Pulwey, Andreas Adolf
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AssigneeCarl Zeiss Microscopy GmbH
InventorsJosef Biberger, Ralph Pulwey, Andreas Adolf
Estimating the term…
An ion beam system comprises a voltage supply system 7 and at least one beam deflector 39 having a plurality of first defection electrodes 51a, 51b, 51c and a plurality of second deflection electrodes 52a, 52b, 52c wherein the voltage supply system is configured to supply different adjustable deflection voltages to the plurality of second deflection electrodes such that electric deflection fields between the plurality of second deflection electrodes and the plurality of opposite first deflection electrodes have a common orientation. The ion beam system has a high kinetic energy mode in which a distribution of the electric deflection fields has a greater width, and a low kinetic energy mode in which a distribution of the electric deflection fields has a smaller width.
An ion beam system having an ion beam path, the system comprising:
Dependencies are inferred from the claim text.