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US 8,710,150 B2Granted
Blended block copolymer composition
AssigneeRohm and Haas Electronic Materials LLC
InventorsShih-Wei Chang, Valeriy V. Ginzburg, Erin B. Vogel, Daniel J. Murray, Peter Trefonas, Phillip D. Hustad
Life of this patent
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Abstract
A block copolymer composition containing a diblock copolymer blend including a first poly(methyl methacrylate)-b-poly((trimethylsilyl)methyl methacrylate) diblock copolymer; and, a second poly(methyl methacrylate)-b-poly((trimethylsilyl)methyl methacrylate) diblock copolymer. Also provided are substrates treated with the block copolymer composition.
Claims10
A block copolymer composition, comprising:
- a diblock copolymer blend, comprising:
- a first poly(methyl methacrylate)-b-poly((trimethylsilyl)methyl methacrylate) diblock copolymer (“DB1”) having a DB1 number average molecular weight, MN-DB1, of 10 to 1,000 kg/mol;
- a DB1 polydispersity, PDDB1, of 1 to 3;
- and,
- a second poly(methyl methacrylate)-b-poly((trimethylsilyl)methyl methacrylate) diblock copolymer (“DB2”) having a DB2 number average molecular weight, MN-DB2, of 1 to 1,000 kg/mol;
- a DB2 polydispersity, PDDB2, of 1 to 3.
3 more elements
Dependencies are inferred from the claim text.