Resist composition and method for producing resist pattern

A resist composition comprising

• a resin having a structural unit represented by the formula (I),
• a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid and not including the structural unit represented by the formula (I), and
• an acid generator represented by the formula (II),
• wherein R1 represents a hydrogen atom or a methyl group;
• A1 represents a C1 to C6 alkanediyl group;
• A13 represents a C1 to C18 divalent aliphatic hydrocarbon group that optionally has one or more halogen atoms;
• X12 represents *—CO—O— or *—O—CO—;
• * represents a bond to A13;
• A14 represents a C1 to C17 aliphatic hydrocarbon group that optionally has one or more halogen atoms;
• wherein Q1 and Q2 independently represent a fluorine atom or a C1 to C6 perfluoroalkyl group;
• L1 represents a C1 to C17 divalent saturated hydrocarbon group, one or more —CH2— contained in the saturated hydrocarbon group may be replaced by —O— or —CO—;
• ring W represents a C3 to C36 alicyclic hydrocarbon group, one or more —CH2— contained in the alicyclic hydrocarbon group may be replaced by —O—, —S—, —CO— or —SO2—, one or more hydrogen atom contained in the alicyclic hydrocarbon group may be replaced with a hydroxy group, a C1 to C12 alkyl group, a C1 to C12 alkoxy group, a C3 to C12 alicyclic hydrocarbon group or a C6 to C10 aromatic hydrocarbon group;
• Rf1 and Rf2 in each occurrence independently represent a fluorine atom or a C1 to C6 fluorinated alkyl group;
• n represents an integer of 1 to 10;
• and
• Z+ represents an organic cation.