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AssigneeShin-Etsu Chemical Co., Ltd.
InventorsHiroki Yoshikawa, Souichi Fukaya, Yukio Inazuki, Tsuneo Yamamoto, Hideo Nakagawa
Estimating the term…
In the chromium-containing material film of the present invention, an element is added thereto and is capable of bringing a mixture of the element and the chromium into a liquid phase at a temperature of 400° C. or lower. The use of such a chromium-containing material film as an optical film (e.g., a light-shielding film, an etching mask film, or an etching stopper film) of a photo mask blank can achieve an improvement in chlorine-dry etching while retaining the same optical characteristics and the like as those of the conventional chromium-containing material film, thereby increasing the patterning precision.
A photo mask blank comprising a film comprising chromium and another element, wherein the other element is capable of bringing a mixture of the other element and the chromium into a liquid phase at a temperature of 400° C. or lower.
A photo mask blank comprising a film comprising chromium and tin, wherein the film has a region in a thickness direction thereof comprising tin at a concentration of 0.5 atomic % or more.
A film mainly comprising chromium, and further comprising another element, wherein the other element is capable of bringing a mixture of the other element and the chromium into a liquid phase at a temperature of 400° C. or lower.
Dependencies are inferred from the claim text.