Method of descaling a mask

A method of descaling a deposition mask, the method comprising:

• providing a deposition mask, the deposition mask comprising:
• a pattern comprising an opening, wherein the opening is configured to pass a material there though to be deposited onto a substrate;
• and
• a thin film of the material attached to the deposition mask;
• directing a laser beam with a pulse frequency of about 60 Hz and a pulse strength of about 600 mJ to about 900 mJ onto the material attached to the deposition mask to weaken the bonds between the material and the mask;
• removing the material attached to the mask, comprising:
• immersing the deposition mask in deionized water, wherein immersing comprises directing an ultrasonic wave into the deionized water while the deposition mask is immersed in the deionized water;
• immersing the deposition mask in a liquid organic solvent;
• and
• drying the deposition mask using an air knife.