US 8,707,899 B2Granted

Plasma processing apparatus

AssigneeHitachi High-Technologies Corporation

InventorsRyouta Kitani, Nobuhide Nunomura, Yasukiyo Morioka, Motohiko Yoshigai

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Abstract

A plasma processing apparatus for processing a subject placed on a subject stage disposed in a processing chamber in a vacuum vessel, by using plasma formed in said processing chamber, includes: an exhaust space communicating with the processing chamber, extending in a horizontal direction, and exhausting gas in the processing chamber; an exhaust port communicating with the exhaust space, the gas being exhausted via the exhaust port; a pump disposed communicating with the exhaust port and exhausting the gas; and a plate member disposed in the exhaust space between a connection portion to the processing chamber and the exhaust port, extending along a direction connecting the connection portion and the exhaust port, and disposed outside a view angle from an upper surface of the subject stage.

Claims8

Dependent claims

A plasma processing apparatus for processing a subject placed on a subject stage disposed at a lower portion of a central portion of a processing chamber in a vacuum vessel, by using plasma generated in a plasma generating space, which has a substantially cylindrical shape and is disposed above said subject stage inside said processing chamber, comprising:

an exhaust space which is disposed below said plasma generating space and is extending outerward in a horizontal direction from said processing chamber, said exhaust space being communicating with said processing chamber so that a gas in said processing chamber flows to said horizontal direction into said exhaust space;
an opening which is disposed at a lower portion of said processing chamber and beneath an upper surface of said subject stage where said subject is located, and communicates with said exhaust space and a space between an outer side wall of said subject stage and an inner side wall of said processing chamber, through said opening said gas within said processing chamber flowing into said exhaust space;
an exhaust port which is disposed at a lower portion of said exhaust space, said exhaust port being distanced in the horizontal direction from said opening so that said gas within said processing chamber entering into said exhaust space through said opening and flowing thereinside to the exhaust port and being exhausted via the exhaust port;
a turbo-molecular pump disposed so as to communicate with said exhaust port and exhaust said gas;
and
a plate member which is disposed at a position inside said exhaust space with gaps both on an upper side and a lower side thereof between said opening and said exhaust port which are distanced each other in said horizontal direction, a surface of said plate member extending along said horizontal direction, said plate member being located at a position so that at least a position of said late member can block linear sputter locus of articles from said exhaust port and an upstream edge with respect to said gas flow inside said exhaust space of said plate member is not directly exposed to an outer edge in a side of said opening of said upper surface of said subject stage.

3 more elements

A plasma processing apparatus for processing a subject placed on a subject stage disposed at a lower portion of a central portion of a processing chamber in a vacuum vessel, by using plasma generated in a plasma generating space which has a substantially cylindrical shape and is disposed above said subject stage inside said processing chamber, comprising:

an exhaust duct which is disposed at a lower portion of said processing chamber beneath said plasma generating space and an upper surface of said subject stage where said subject is located, communicates with a space between an outer side wall of said subject stage and an inner side wall of said processing chamber, and extends outerward from said processing chamber in a horizontal direction, a gas in said processing chamber flowing into said exhaust duct and then being exhausted out therethrough;
an exhaust port which is disposed at a lower portion of said exhaust space and communicates with a space inside of said exhaust duct, said exhaust port being distanced in the horizontal direction from an entrance opening of said exhaust duct which communicates with said space between an outer side of said subject stage and an inner side wall of said processing chamber, and said gas in said processing chamber entering into said exhaust duct and flowing therethrough and being exhausted via said exhaust port;
a turbo-molecular pump disposed so as to communicate with said exhaust port and exhaust said gas;
and
a plate member disposed inside said exhaust duct with gaps both on an upper side and a lower side thereof, and between said exhaust port and said entrance opening of said exhaust duct, said entrance opening facing a side wall of said subject stage, said plate member extending along a direction of a gas flow in said exhaust duct, and said plate member being located at a position so that at least a position of said plate member can block linear sputter locus of particles from said exhaust port and an entrance side edge of said plate member is not directly exposed to an outer edge in a side of said opening of said upper surface of said subject stage.

2 more elements

Dependencies are inferred from the claim text.