Methods and apparatus for calibrating flow controllers in substrate processing systems

A method for calibrating a plurality of flow controllers in a substrate processing system, the method comprising:

• providing a first gas to a mass flow verifier by a first flow controller coupled to a first zone of a first process chamber;
• determining a first flow rate of the first gas using the mass flow verifier;
• providing a second gas to the mass flow verifier by a second flow controller coupled to a second zone of the first process chamber;
• and
• determining a second flow rate of the second gas using the mass flow verifier, wherein the first flow controller is capable of providing the first gas to the first zone while the second flow controller is providing the second gas to the mass flow verifier.

A substrate processing system, comprising:

• a cluster tool comprising a first process chamber and a second process chamber coupled to a central vacuum transfer chamber;
• a first flow controller to provide a process gas to the first process chamber;
• a second flow controller to provide the process gas to the second process chamber;
• a mass flow verifier to verify a flow rate from each of the first and second flow controllers;
• a first conduit to selectively couple the first flow controller to the mass flow verifier;
• and
• a second conduit to selectively couple the second flow controller to the mass flow verifier.

A substrate processing system, comprising:

• a first flow controller to provide a process gas to a first zone of a first process chamber;
• a second flow controller to provide the process gas to a second zone of the first process chamber;
• a mass flow verifier to verify a flow rate from each of the first and second flow controllers;
• a first conduit to selectively couple the first flow controller to the mass flow verifier;
• and
• a second conduit to selectively couple the second flow controller to the mass flow verifier.