Plasma process apparatus and plasma process method

A plasma process apparatus that applies a plasma process to an object to be processed, the plasma process apparatus comprising:

• a processing container, which is shaped like a cylinder and is configured to be evacuatable to vacuum;
• a holding unit configured to hold plural objects to be processed and inserted into and to be extracted from the processing container;
• a gas supplying unit configured to supply a gas into the processing container;
• an activating unit, which is located along a longitudinal direction of the processing container and is configured to activate the gas by plasma generated by a high frequency power, the activating unit including
• a plasma generating box which is subdivided by a plasma compartment wall provided along the longitudinal direction of the processing container,
• plasma electrodes provided along the longitudinal direction of the plasma compartment wall, and
• a high frequency power source connected to the plasma electrodes;
• a cylindrical shield cover configured to surround a periphery of the processing container and to be connected to ground for shielding from high frequency;
• and
• a cooling device that includes an exhaust header including an end plate, the end plate clogging an upper end face of the cylindrical shield cover, including cooling gas flow holes, and being made of metal having a shield function of shielding against high frequency, the cooling device being configured to cause a cooling gas to flow through a space between the cylindrical shield cover and the processing container during the plasma process.