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US 8,664,733 B2Granted
MEMS microphone and method for manufacture
AssigneeEpcos AG
InventorPirmin Hermann Otto Rombach
Life of this patent
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Abstract
An improved method for manufacturing an MEMS microphone with a double fixed electrode is specified which results in a microphone which likewise has improved properties.
Claims5
A microphone of miniaturized MEMS design
- having a substrate comprising silicon and a patterned layer construction arranged thereon,
- wherein the layer construction comprises partial layers arranged one above another for the following functional layers:
- a bottom fixed electrode, thereabove
- a membrane and thereabove
- a top fixed electrode,
- wherein the membrane is areally divided into
- an outer edge region,
- a freely oscillating region, which is completely enclosed by the outer edge region and in which the membrane is embodied in substantially planar fashion,
- an anchor region within the outer edge region, in which the membrane is vertically fixed between bottom and top fixed electrodes, wherein the outer edge region substantially consists of the anchor region,
- a connection region within the outer edge region, in which an electrical lead to the membrane is arranged,
- wherein a perforation is arranged through the substrate below the entire freely oscillating region, and wherein the anchor region is arranged outside the area region of the perforation above an inner edge region of the substrate,
- wherein the partial layers forming the membrane are electrically isolated from the remaining area regions of the corresponding partial layers by an incision running outside the outer edge region and omitting the connection region, and
- wherein, at least outside the region enclosed by the incision, insulation layers are arranged between bottom fixed electrode and membrane and between membrane and top fixed electrode.
10 more elements
Dependencies are inferred from the claim text.