Pulsed laser micro-deposition pattern formation
AssigneeImra America, Inc.
InventorsBing Liu, Zhendong Hu, Makoto Murakami, Jingzhou Xu, Yong Che
Life of this patent
Estimating the term…
Loading patent…
AssigneeImra America, Inc.
InventorsBing Liu, Zhendong Hu, Makoto Murakami, Jingzhou Xu, Yong Che
Estimating the term…
A method of forming patterns on transparent substrates using a pulsed laser is disclosed. Various embodiments include an ultrashort pulsed laser, a substrate that is transparent to the laser wavelength, and a target plate. The laser beam is guided through the transparent substrate and focused on the target surface. The target material is ablated by the laser and is deposited on the opposite substrate surface. A pattern, for example a gray scale image, is formed by scanning the laser beam relative to the target. Variations of the laser beam scan speed and scan line density control the material deposition and change the optical properties of the deposited patterns, creating a visual effect of gray scale. In some embodiments patterns may be formed on a portion of a microelectronic device during a fabrication process. In some embodiments high repetition rate picoseconds and nanosecond sources are configured to produce the patterns.
A method of pulsed laser deposition to produce a pattern on a medium, said medium being substantially transparent at a wavelength of said pulsed laser, said method comprising:
Dependencies are inferred from the claim text.