Ion beam sample preparation apparatus and methods

An ion beam sample preparation apparatus comprising:

• (a) an ion beam irradiating means disposed in a vacuum chamber and directing an ion beam toward a shield;
• said ion beam further characterized as being a broad ion beam;
• (b) a rotating shield retention stage disposed in the vacuum chamber;
• said shield retention stage comprising:
• i. a first datum feature;
• ii. a second datum feature;
• iii. a shield retention means having at least a shield releasing position and a shield retaining position;
• iv. a rotation axis located substantially in the plane of the first datum feature;
• v. a rotation drive for rotating the shield retention stage around the rotation axis;
• (c) the shield having at least a rigid planar portion, removeably and replaceably held in said shield retention stage, said shield further comprising:
• i. a third datum feature formed integrally with the shield, wherein said shield retention means in said shield retaining position urges said third datum feature to abut said first datum feature;
• ii. a fourth datum feature formed integrally with the shield, wherein said shield retention means in said shield retaining position urges said fourth datum feature to abut said second datum feature;
• iii. a first shielding surface disposed in the path of the ion beam and positioned to shield a portion of the ion beam directed at the sample when said shield is held in the shield retaining position of the shield retention means;
• iv. a proximal sample surface configured to durably adhere the sample to the shield;
• v. a shield edge formed where the first shielding surface meets the proximal sample surface, wherein said shield edge is held substantially perpendicular to said rotation axis when said shield is held in the shield retaining position of the shield retention means.

A kit for preparing a sample in an ion beam sample preparation device using a broad ion beam, said kit comprising:

• (a) a shield retention stage comprising:
• i. a first datum feature;
• ii. a second datum feature;
• iii. a shield retention means having at least a shield releasing position and a shield retaining position;
• (b) a shield having at least a rigid planar portion, removeably and replaceably held in said shield retention stage, said shield further comprising:
• i. a third datum feature formed integrally with said shield, wherein said shield retention means in said shield retaining position urges said third datum feature to abut said first datum feature;
• ii. a fourth datum feature formed integrally with said shield, wherein said shield retention means in said shield retaining position urges said fourth datum feature to abut said second datum feature;
• iii. a first shielding surface,
• iv. a proximal sample surface for durably adhering the sample to the shield.

A kit for observing in a microscope a sample prepared in an ion beam sample preparation device using a broad ion beam, said kit comprising:

• (a) a shield retention stage comprising:
• i. a first datum feature;
• ii. a second datum feature;
• iii. a shield retention means having at least a shield releasing position and a shield retaining position;
• (b) a shield having at least a rigid planar portion, removeably and replaceably held in said shield retention stage, said shield further comprising:
• i. a third datum feature formed integrally with the shield, wherein said shield retention means in said shield retaining position urges said third datum feature to abut said first datum feature;
• ii. a fourth datum feature formed integrally with the shield, wherein said shield retention means in said shield retaining position urges said fourth datum feature to abut said second datum feature;
• iii. a first shielding surface;
• and,
• iv. a proximal sample surface for durably adhering the sample to the shield.