Process kit shield for plasma enhanced processing chamber

A process kit for use in a plasma enhanced substrate processing system, comprising:

• a first shield having a first end, a second end, and one or more first sidewalls disposed between the first and second ends, wherein the first end is configured to interface with a first support member of a process chamber to support the first shield in a position such that the one or more first sidewalls surround a first volume of an inner volume of the process chamber, and wherein the one or more first sidewalls are configured to surround an upper portion of a substrate support disposed in the process chamber;
• and
• a second shield having a first end, a second end, and one or more second sidewalls disposed between the first and second ends of the second shield and surrounding the first shield, wherein the first end of the second shield is configured to interface with a second support member of the process chamber to support the second shield in a position such that the second shield contacts a compressible element between the first shield and the second shield to form a seal therebetween, wherein the second end of the second shield includes a second lip extending inward from the one or more second sidewalls and beyond a first volume facing side of the one or more first sidewalls, wherein the compressible element is disposed between the second lip and the second end of the first shield to form the seal, and wherein the second end of the second shield is configured to support a first ring disposed about a support surface of the substrate support.