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US 8,641,839 B2Granted
Method for imprinting and erasing amorphous metal alloys
AssigneeYale University
InventorsJan Schroers, Golden Kumar, Hongxing Tang
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AssigneeYale University
InventorsJan Schroers, Golden Kumar, Hongxing Tang
Estimating the term…
The present invention relates to materials, methods and apparatuses for performing imprint lithography using amorphous metallic materials. The amorphous metallic materials can be employed as imprint media and thermoplastic forming processes are applied during the pattern transfer procedure to produce micron scale and nanoscale patterns in the amorphous metallic layer. The pattern transfer is in the form of direct mask embossing or through a serial nano-indentation process. A rewriting process is also disclosed, which involves an erasing mechanism that is accomplished by means of a second thermoplastic forming process. The amorphous metallic materials may also be used directly as an embossing mold in imprint lithography to allow high volume imprint nano-manufacturing. This invention also comprises of a method of smoothening surfaces under the action of the surface tension alone.
A method of imprinting microfeatures or nanofeatures into an amorphous metal alloy layer, the method comprising the steps of:
A method of erasing a pattern formed in a surface of an amorphous metal alloy substrate, the method comprising the steps of:
The method according to 14, wherein the erasing time is between about 0.1 and about 20 seconds.
A method of imprinting microfeatures or nanofeatures into an amorphous metal alloy layer, the method comprising the steps of:
Dependencies are inferred from the claim text.