Out-of plane MEMS resonator with static out-of-plane deflection
AssigneeSilicon Laboratories Inc.
InventorsEmmanuel P. Quevy, David H. Bernstein, Mehrnaz Motiee
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Abstract
A method of forming a microelectromechanical systems (MEMS) device includes forming an electrode on a substrate. The method includes forming a structural layer on the substrate. The structural layer is disposed about a perimeter of the electrode and has a residual film stress gradient. The method includes releasing the structural layer to form a resonator coupled to the substrate. The residual film stress gradient deflects a first portion of the resonator out of a plane defined by a surface of the electrode.
Claims20
A method of forming a microelectromechanical systems (MEMS) device, the method comprising:
- forming an electrode on a substrate;
- forming a structural layer on the substrate, the structural layer disposed about a perimeter of the electrode and having a thickness and a residual film stress gradient;
- and
- releasing the structural layer to form a resonator coupled to the substrate, the residual film stress gradient deflecting a first portion of the resonator out of a plane defined by a surface of the electrode,
- wherein the resonator comprises a cantilever beam and a first plurality of lattice beams extending along a length of the cantilever beam.
A method of forming a microelectromechanical systems (MEMS) device, the method comprising:
- forming an electrode on a substrate;
- forming a structural layer on the substrate, the structural layer disposed about a perimeter of the electrode and having a residual film stress gradient;
- and
- releasing the structural layer to form a resonator coupled to the substrate, the residual film stress gradient deflecting a first portion of the resonator out of a plane defined by a surface of the electrode,
- wherein forming the structural layer further comprises at least one of laser recrystallization or metal-induced crystallization to vary the crystallinity over the thickness of the structural layer.
A method of forming a microelectromechanical systems (MEMS) device, the method comprising:
- forming an electrode on a substrate;
- forming a structural layer on the substrate, the structural layer disposed about a perimeter of the electrode and having a residual film stress gradient;
- releasing the structural layer to form a resonator coupled to the substrate, the residual film stress gradient deflecting a first portion of the resonator out of a plane defined by a surface of the electrode;
- and
- forming a tuning plate above a second electrode.
Dependencies are inferred from the claim text.