System and method for fabricating a magnetic recording pole
AssigneeWestern Digital (Fremont), LLC
InventorsLili Ji, Ming Jiang, Jerome S. Marcelino, Shawn M. Tanner, Dujiang Wan, Tiffany Yun Wen Jiang
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Abstract
Systems and methods for fabricating a microelectric device are provided herein. Particular embodiments provide systems and methods for fabricating a magnetic recording pole for a magnetic recording head, such as an energy assisted magnetic recording (EAMR) head commonly used in a disk storage device. Some embodiments provide for systems and methods of fabricating magnetic recording poles that protect the core of the magnetic recording head during the removal of removal of seed layers.
Claims17
A method for fabricating a magnetic recording pole, comprising:
- forming a layer of SiO2 over a substrate layer of a wafer;
- forming a first seed layer over the layer of SiO2;
- forming at least one magnetic pole layer over a portion of the first seed layer, wherein the at least one magnetic pole layer comprises a layer of NiFe disposed over a layer of CoNiFe;
- and
- removing a remaining portion of the first seed layer not disposed under the at least one magnetic pole layer.
A magnetic recording pole, comprising:
- a layer of SiO2 disposed over a substrate layer of a wafer;
- a seed layer disposed over the layer of SiO2;
- and
- at least one magnetic pole layer disposed over a portion of the seed layer, wherein the at least one magnetic pole layer comprises a layer of NiFe disposed over a layer of CoNiFe.
A disk drive, comprising:
- a media;
- a slider;
- and
- a magnetic recorder pole coupled to the slider, the magnetic recorder pole comprising:
- a layer of SiO2 disposed over a substrate layer of a wafer;
- a seed layer disposed over the layer of SiO2;
- and
- at least one magnetic pole layer disposed over a portion of the seed layer, wherein the at least one magnetic pole layer comprises a layer of NiFe disposed over a layer of CoNiFe.
A magnetic recording pole, comprising:
- a layer of SiO2 disposed over a substrate layer of a wafer;
- a seed layer disposed over the layer of SiO2;
- and
- at least one magnetic pole layer disposed over a portion of the seed layer wherein the at least one magnetic pole layer comprises a layer of 1.6T NiFe disposed over a layer of 2.3T CoNiFe.
A method for fabricating a magnetic recording pole, comprising:
- forming a layer of SiO2 over a substrate layer of a wafer;
- forming a first seed layer over the layer of SiO2;
- forming at least one magnetic pole layer over a portion of the first seed layer, wherein the at least one magnetic pole layer comprises a layer of 1.6T NiFe disposed over a layer of 2.3T NiFe;
- and
- removing a remaining portion of the first seed layer not disposed under the at least one magnetic pole layer.
A method for fabricating a magnetic recording pole, comprising:
- forming a layer of SiO2 over a substrate layer of a wafer;
- forming a first seed layer over the layer of SiO2;
- forming at least one magnetic pole layer over a portion of the first seed layer, wherein forming the at least one magnetic pole layer comprises:
- forming a second seed layer over the first seed layer, wherein the second seed layer comprises a trench exposing at least a portion of the first seed layer through the trench,
- forming a first patterned resist layer in the trench over the first seed layer, wherein the first patterned resist layer is configured to define at least a portion of the at least one magnetic pole layer in the trench,
- forming a patterned magnetic layer at least in the trench over the first seed layer such that the patterned magnetic layer is defined by the first patterned resist layer and the patterned magnetic layer is at least disposed in the trench over the first seed layer,
- removing the patterned resist layer, and
- removing a first portion of the patterned magnetic layer such that a second portion of the patterned magnetic layer remains disposed in the trench and over the first seed layer, whereby the second portion forms the at least one magnetic pole layer;
- and
- removing a remaining portion of the first seed layer not disposed under the at least one magnetic pole layer.
Dependencies are inferred from the claim text.