Method and apparatus for developing, improving and verifying virtual metrology models in a manufacturing system
AssigneeApplied Materials, Inc.
InventorJames Moyne
Life of this patent
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AssigneeApplied Materials, Inc.
InventorJames Moyne
Estimating the term…
A computing device develops a first non-adaptive virtual metrology (VM) model for a manufacturing process based on performing a non-adaptive regression using a first data set. Upon determining that an accuracy of the first non-adaptive VM model satisfies a first quality criterion, the computing device develops an adaptive VM model for the manufacturing process based on performing an adaptive regression using at least one of the first data set or a second data set. The computing device evaluates an accuracy of the adaptive VM model using a third data set that is larger than the first data set and the second data set. The computing device determines that the adaptive VM model is ready for use in production upon determining that an accuracy of the first adaptive VM model satisfies a second quality criterion that is more stringent than the first quality criterion.
A computer implemented method comprising:
A computer readable storage medium including instructions that, when executed by a processing device, cause the processing device to perform a method comprising:
A computing apparatus comprising:
Dependencies are inferred from the claim text.